SCHEMBL409706

SCHEMBL409706

COCC(C)(C)C(=O)CC(=O)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7947467 0.84
SCHEMBL410911 0.84 CNR2 (0.30)
SCHEMBL3273808 0.82 MGAM (0.42)
SCHEMBL93393 0.77 KMT2A (0.39)
SCHEMBL4837194 0.77 KMT2A (0.39)
SCHEMBL12802885 0.77
SCHEMBL22657344 0.75
SCHEMBL19216588 0.75 GAA (0.52)
SCHEMBL20544935 0.74 TRPA1 (0.33)
SCHEMBL21405194 0.74 KMT2A (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9663538-B2 Aluminum compound, thin-film forming raw material, and method for producing thin film ADEKA CORPORATION (JP) 2017-05-30 US claimed
US-12630570-B2 Organometallic adduct compound and method of manufacturing integrated circuit device by using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-05-19 US disclosed
EP-4130010-B1 ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2026-04-29 EP disclosed
EP-4067365-B1 COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2026-03-25 EP disclosed
US-12577660-B2 Compound, thin-film forming raw material, thin-film, and method of producing thin-film ADEKA CORPORATION (JP) 2026-03-17 US disclosed
US-20260055506-A1 HALOGEN COMPOUND ADEKA CORPORATION (JP) 2026-02-26 US disclosed
US-20260055507-A1 THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM ADEKA CORPORATION (JP) 2026-02-26 US disclosed
US-12516415-B2 Reactive material and method of producing thin-film ADEKA CORPORATION (JP) 2026-01-06 US disclosed
US-12509764-B2 Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film ADEKA CORPORATION (JP) 2025-12-30 US disclosed
EP-4660187-A1 COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM ADEKA CORPORATION (JP) 2025-12-10 EP disclosed
US-20100126351-A1 METHOD FOR PRODUCING A MATERIAL FOR CHEMICAL VAPOR DEPOSITION ADEKA CORPORATION (JP) 2010-05-27 US disclosed
US-7714155-B2 Alkoxide compound, material for thin film formation, and process for thin film formation ADEKA CORPORATION (JP) 2010-05-11 US disclosed
US-7501153-B2 Alkoxide compound, thin film-forming material and method for forming thin film ADEKA CORPORATION (JP) 2009-03-10 US disclosed
US-20090035464-A1 Alkoxide compound, material for thin film formation, and process for thin film formation ADEKA CORPORATION (JP) 2009-02-05 US disclosed
US-20080085365-A1 Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film ADEKA CORPORATION (JP) 2008-04-10 US disclosed
US-7335783-B2 Thin film-forming material and method for producing thin film ADEKA CORPORATION (JP) 2008-02-26 US disclosed
US-20070190249-A1 Material for chemical vapor deposition and thin film forming method ADEKA CORPORATION (JP) 2007-08-16 US disclosed
US-20070178235-A1 Thin film-forming material and method for producing thin film ADEKA CORPORATION (JP) 2007-08-02 US disclosed
EP-1770187-A1 THIN FILM-FORMING MATERIAL AND METHOD FOR PRODUCING THIN FILM Adeka Corporation (JP) 2007-04-04 EP disclosed
EP-1754800-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND THIN FILM FORMING METHOD Adeka Corporation (JP) 2007-02-21 EP disclosed