SCHEMBL4097842

SCHEMBL4097842

COC(=O)C12CC3CC(C(=O)OC)(C1)CC(C(C)=C(C)C(=O)O)(C3)C2

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.37
NPSR1 Q6W5P4 1/20 0.35
ALDH1A1 P00352 1/20 0.32
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4100142 0.93 MEN1 (0.39) GLANPSR1POLB
SCHEMBL4084962 0.93 NPSR1 (0.34) GLANPSR1ALDH1A1
SCHEMBL4095721 0.89 ALDH1A1 (0.37) GLANPSR1ALDH1A1
SCHEMBL4093646 0.88 NPSR1 (0.32) GLANPSR1
SCHEMBL4103943 0.87 NPSR1 (0.46) GLANPSR1ALDH1A1POLB
SCHEMBL5084581 0.84 GLA (0.42) GLANPSR1ALDH1A1
SCHEMBL5082232 0.80 ALDH1A1 (0.39) GLANPSR1ALDH1A1
SCHEMBL5084537 0.80 ALDH1A1 (0.39) GLANPSR1ALDH1A1
SCHEMBL4103900 0.78 SMN1; SMN2 (0.38)
SCHEMBL4089963 0.77 SMN1; SMN2 (0.41) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed