SCHEMBL4098799

SCHEMBL4098799

CCC(C)c1ccc(CCl)cc1

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
TSHR P16473 3/20 0.42
ALDH1A1 P00352 2/20 0.42
CYP2C9 P11712 1/20 0.42
USP2 O75604 1/20 0.41
GAA P10253 1/20 0.41
PKM P14618 1/20 0.41
HPGD P15428 1/20 0.41
ALOX15 P16050 1/20 0.41
HSD17B10 Q99714 1/20 0.41
NPC1 O15118 3/20 0.40
RAB9A P51151 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
MAPK1 P28482 1/20 0.39
ATM Q13315 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
HSP90AA1 P07900 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9502746 0.89 ALDH1A1 (0.46) TSHRALDH1A1CYP2C9GAANPC1
SCHEMBL1304417 0.84 ESR1 (0.43) ESR1ESR2TSHRALDH1A1CYP2C9
SCHEMBL13445524 0.84 ESR1 (0.43) ESR1ESR2TSHRCYP2C9L3MBTL1
SCHEMBL6643275 0.83 ESR1 (0.39) ESR1ESR2TSHRL3MBTL1MAPK1
SCHEMBL598140 0.83 ALDH1A1 (0.52) ESR1ESR2TSHRALDH1A1CYP2C9
SCHEMBL17138225 0.82 ESR1 (0.63) ESR1ESR2TSHRCYP2C9
SCHEMBL9348164 0.81 TSHR (0.52) ESR1ESR2TSHRALDH1A1CYP2C9
SCHEMBL9838746 0.81 ESR1 (0.45) ESR1ESR2TSHRALDH1A1CYP2C9
SCHEMBL18295687 0.81 TSHR (0.52) ESR1ESR2TSHRALDH1A1CYP2C9
SCHEMBL6641065 0.80 ESR1 (0.45) ESR1ESR2TSHRALDH1A1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231228-A1 RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-07-11 US disclosed
EP-4394506-A1 RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME Samsung Electronics Co., Ltd. (KR) 2024-07-03 EP disclosed
EP-4394507-A1 RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME Samsung Electronics Co., Ltd. (KR) 2024-07-03 EP disclosed
US-11807023-B2 Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method FUJIFILM CORPORATION (JP) 2023-11-07 US disclosed
US-20230295455-A1 FLOW CELLS ILLUMINA, INC. 2023-09-21 US disclosed
US-20220185927-A1 HYDROGEL ILLUMINA CAMBRIDGE LIMITED (GB) 2022-06-16 US disclosed
US-20220001372-A1 METHOD FOR PRODUCING RESIN USEFUL IN SEMICONDUCTOR MANUFACTURING FILM TEC WATER JAPAN KABUSHIKI KAISHA (JP) 2022-01-06 US disclosed
US-20180171495-A1 Ion-Conducting Membranes U.S. DEPARTMENT OF ENERGY 2018-06-21 US disclosed
US-9982068-B2 Redox active polymers and colloidal particles for flow batteries THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) 2018-05-29 US disclosed
US-9950319-B2 High exchange-capacity anion exchange resin with dual functional-groups and method of synthesis thereof NANJING UNIVERSITY (CN) 2018-04-24 US disclosed
US-20070141474-A1 Copolymer with phosphoryl group and molded articles of same EBARA CORPORATION (JP) 2007-06-21 US disclosed
US-7186671-B2 Particulate alumina and process for removing metal ions from water AQUATIC TREATMENT SYSTEMS, INC. (US) 2007-03-06 US disclosed
US-7183367-B2 Vinyl sulphone modified polymer N.V. ORGANON (NL) 2007-02-27 US disclosed
US-20070007132-A1 Transition metal complexes with bidentate ligand having an imidazole ring ABBOTT DIABETES CARE INC. 2007-01-11 US disclosed
US-6727273-B2 THERAPY FOR OSTEOPOROSIS, ANTICANCER AGENTS CHIRON CORPORATION 2004-04-27 US disclosed
EP-1073655-B1 PHARMACEUTICALLY AVAILABLE PROTOBERBERINE SALTS DERIVATIVES, AND PROTOBERBERINE DERIVATIVES AND SALTS THEREOF HANWHA CHEMICAL CORP (KR) 2004-04-14 EP disclosed
EP-1073655-A1 PHARMACEUTICALLY AVAILABLE PROTOBERBERINE SALTS DERIVATIVES, AND PROTOBERBERINE DERIVATIVES AND SALTS THEREOF HANWHA CHEMICAL CORPORATION (KR) 2001-02-07 EP disclosed
US-6030978-A EXHIBIT FUNGICIDAL EFFECT OR GROWTH-INHIBITORY EFFECT AGAINST FUNGI INCLUDING CUTANEOUS FILAMENTOUS FUNGUS, SUCH AS EPIDERMOPHYTON, MICROSPORUM, TRICHOPHYTON, SPOROTHRIX SCHENCKII, ASPERGILLUS OR CANDIDA; NONTOXICITY; HANWHA CORPORATION (KR) 2000-02-29 US disclosed
US-6008356-A BRBERINE SALT DERIVATIVE IS REACTED WITH SODIUM TETRABORATE AND POTASSIUM CARBONATE IN ALCOHOL SOLVEANT TO FORM INTERMEDIATE, REACTING INTERMEDIATE WITH ALKYL SUBSTITUENT IN ACETONITRILE SOLVENT, OXIDIZING THE FORMED INTERMEDIATE HANWHA CORPORATION (KR) 1999-12-28 US disclosed
WO-1999055704-A1 PHARMACEUTICALLY AVAILABLE PROTOBERBERINE SALTS DERIVATIVES, AND PROTOBERBERINE DERIVATIVES AND SALTS THEREOF HANWHA CHEMICAL CORPORATION (KR) 1999-11-04 WO disclosed