SCHEMBL4100640

SCHEMBL4100640

C=CC(=O)OC12C(F)(F)C3(O)C(F)(F)C(F)(C(F)(F)C(F)(C3(F)F)C1(F)F)C2(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4333990 0.96
SCHEMBL4320958 0.96
SCHEMBL137442 0.91 TSHR (0.31)
SCHEMBL14510336 0.89 TSHR (0.30)
SCHEMBL822781 0.89 TSHR (0.30)
SCHEMBL14510703 0.89 TSHR (0.30)
SCHEMBL14510504 0.87
SCHEMBL4323604 0.87 TSHR (0.31)
SCHEMBL12977894 0.81
SCHEMBL4328621 0.80 TSHR (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090156854-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2009-06-18 US disclosed
US-7528279-B2 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD. (JP) 2009-05-05 US disclosed
US-7326512-B2 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound TOKYO OHKA KOGYO CO., LTD. (JP) 2008-02-05 US disclosed
US-7326512-B2 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound TOKYO OHKA KOGYO CO., LTD. (JP) 2008-02-05 US disclosed
US-7326512-B2 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound TOKYO OHKA KOGYO CO., LTD. (JP) 2008-02-05 US disclosed
US-20070129566-A1 FLUOROADAMANTANE DERIVATIVE ASAHI GLASS COMPANY, LIMITED (JP) 2007-06-07 US disclosed
US-20070129532-A1 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD (JP) 2007-06-07 US disclosed
EP-1712542-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2006-10-18 EP disclosed
US-20050130056-A1 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound UBS AG, STAMFORD BRANCH 2005-06-16 US disclosed
WO-2004050725-A1 POLYMER COMPOUND, RESIST COMPOSITION AND DISSOLUTION INHIBITOR AGENT CONTAINING THE POLYMER COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2004-06-17 WO disclosed