Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | P2RX7 | Q99572 | 6/20 | 0.45 |
| ▸ | PPARG | P37231 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15477515 | 0.82 | ALDH1A1 (0.52) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL15936332 | 0.79 | ENPP1 (0.55) | ALDH1A1HTTPPARGLMNATDP1 | |
| SCHEMBL3841899 | 0.79 | ALDH1A1 (0.61) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL1824280 | 0.79 | ALDH1A1 (0.51) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL1828145 | 0.79 | MEN1 (0.46) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL1826570 | 0.78 | ALDH1A1 (0.53) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL1823691 | 0.78 | SMN1; SMN2 (0.57) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL2843516 | 0.77 | CXCR2 (0.43) | ALDH1A1HTTKMT2APPARG | |
| SCHEMBL346667 | 0.77 | HTT (0.59) | ALDH1A1MEN1MAPTHTTKMT2A | |
| SCHEMBL2237142 | 0.77 | TDP1 (0.67) | ALDH1A1MEN1MAPTHTTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9134611-B2 | Composition for forming resist underlayer film and pattern-forming method | JSR CORPORATION (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20140048512-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-02-20 | — | — | US | disclosed |
| US-20090221777-A1 | PHOTOSENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |