SCHEMBL4126515

SCHEMBL4126515

C=C(F)OS(=O)(=O)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.43
TSHR P16473 1/20 0.43
DUSP3 P51452 1/20 0.41
PTPN5 P54829 1/20 0.41
PTPN11 Q06124 1/20 0.41
HTR6 P50406 1/20 0.41
TDP1 Q9NUW8 2/20 0.40
PARL Q9H300 1/20 0.40
MAPT P10636 4/20 0.39
ALDH1A1 P00352 6/20 0.39
KDM4E B2RXH2 3/20 0.39
KMT2A Q03164 2/20 0.39
HPGD P15428 1/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
APOBEC3G Q9HC16 1/20 0.39
MMP1 P03956 1/20 0.39
MMP2 P08253 1/20 0.39
MMP9 P14780 1/20 0.39
MMP8 P22894 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28263244 0.83 TDP1 (0.44) SMN1; SMN2TSHRDUSP3PTPN5PTPN11
SCHEMBL15352431 0.83 SMN1; SMN2 (0.46) SMN1; SMN2TSHRDUSP3PTPN5PTPN11
SCHEMBL4119814 0.80 ALDH1A1 (0.46) SMN1; SMN2ALDH1A1KMT2ACA1CA2
SCHEMBL4133184 0.79 APOBEC3G (0.43) SMN1; SMN2TSHRDUSP3PTPN5PTPN11
SCHEMBL9388412 0.79 TSHR (0.43) SMN1; SMN2TSHRHTR6TDP1PARL
SCHEMBL15352489 0.78 TDP1 (0.47) SMN1; SMN2TSHRDUSP3PTPN5PTPN11
SCHEMBL18141216 0.78 TSHR (0.41) SMN1; SMN2TSHRHTR6TDP1PARL
SCHEMBL18139101 0.78 TSHR (0.41) SMN1; SMN2TSHRHTR6TDP1PARL
SCHEMBL18140394 0.78 TSHR (0.41) SMN1; SMN2TSHRHTR6TDP1PARL
Ammonia Solution, Strong SCHEMBL18140062 0.78 TSHR (0.41) SMN1; SMN2TSHRHTR6TDP1PARL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103046087-B A kind of method and electroplate liquid thereof plating pure iron WUHAN TIANLI SURFACE TECHNOLOGY CO., LTD., (CN) 2015-09-02 CN claimed
CN-103046087-A Pure iron plating method and electroplating liquid thereof Wuhan tianli surface technology co ltd 2013-04-17 CN claimed
US-12100809-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-24 US disclosed
US-20220149436-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-11283107-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
EP-3621141-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2020-03-11 EP disclosed
US-20190229372-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2019-07-25 US disclosed
US-10333172-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2019-06-25 US disclosed
US-10290901-B2 2019-05-14 US disclosed
US-20170084955-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2017-03-23 US disclosed
CN-103046087-B A kind of method and electroplate liquid thereof plating pure iron WUHAN TIANLI SURFACE TECHNOLOGY CO., LTD., (CN) 2015-09-02 CN disclosed
US-20150056503-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2015-02-26 US disclosed
CN-103046087-A Pure iron plating method and electroplating liquid thereof Wuhan tianli surface technology co ltd 2013-04-17 CN disclosed
EP-2012386-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2009-01-07 EP disclosed