Aniline

Aniline

SCHEMBL4129909

CCC[Si](C)(OC)OC.Nc1ccccc1

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
MAOA P21397 4/20 0.33
MAOB P27338 4/20 0.33
CYP3A4 P08684 4/20 0.33
TDP1 Q9NUW8 4/20 0.33
MAPT P10636 3/20 0.33
ALDH1A1 P00352 3/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
KDM4E B2RXH2 2/20 0.33
CYP1A2 P05177 2/20 0.33
CYP2C9 P11712 2/20 0.33
CYP2C19 P33261 2/20 0.33
CYP2D6 P10635 1/20 0.33
RAB9A P51151 4/20 0.32
NPC1 O15118 3/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
TP53 P04637 1/20 0.32
GAA P10253 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Aniline SCHEMBL113461 0.82 TSHR (0.44) TSHRMAOAMAOBCYP3A4TDP1
Benzylamine SCHEMBL29255677 0.81 LOXL2 (0.50) TSHRMAOAMAOBCYP3A4CYP1A2
Aniline SCHEMBL10943399 0.81 TSHR (0.42) TSHRMAOAMAOBCYP3A4TDP1
Aniline SCHEMBL28065799 0.80 TSHR (0.38) TSHRMAOAMAOBMAPTL3MBTL1
Diphenylamine SCHEMBL29183344 0.79 HSD17B10 (0.44) TSHRCYP3A4TDP1MAPTALDH1A1
Methylamine SCHEMBL906130 0.76
SCHEMBL122896 0.76
Aniline SCHEMBL2117721 0.76 TSHR (0.41) TSHRMAOBCYP3A4TDP1MAPT
Aniline SCHEMBL28396621 0.75 TSHR (0.50) TSHRMAOAMAOBCYP3A4TDP1
Aniline SCHEMBL29001217 0.74 TSHR (0.55) TSHRMAOAMAOBCYP3A4TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1418021-B1 Polishing pad JSR CORP (JP) 2009-01-21 EP disclosed
US-6992123-B2 Polishing pad JSR CORPORATION (JP) 2006-01-31 US disclosed
US-20040118051-A1 Polishing pad JSR CORPORATION (JP) 2004-06-24 US disclosed
EP-1418021-A1 Polishing pad JSR Corporation (JP) 2004-05-12 EP disclosed
US-5789127-A Electrophotographic photoreceptor FUJI XEROX CO., LTD. (JP) 1998-08-04 US disclosed
EP-0243806-A2 Pendant quinodimethane-containing polymers CELANESE CORPORATION (US) 1987-11-04 EP disclosed