Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.36 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.36 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL27705602 | 1.00 | TDP1 (0.39) | TDP1POLBL3MBTL1PABPC1APOBEC3A | |
| Methacrylic Acid SCHEMBL4122919 | 0.96 | POLB (0.36) | TDP1POLBL3MBTL1PABPC1APOBEC3A | |
| Methacrylic Acid SCHEMBL4123681 | 0.91 | POLB (0.34) | TDP1POLBL3MBTL1TGFBR1 | |
| Methacrylic Acid SCHEMBL4136553 | 0.82 | TGFBR1 (0.32) | TDP1POLBL3MBTL1TGFBR1CA1 | |
| Methacrylic Acid SCHEMBL14693612 | 0.81 | POLB (0.35) | POLBL3MBTL1EPHX1CA1CA2 | |
| Methacrylic Acid SCHEMBL2278912 | 0.81 | POLB (0.35) | POLBL3MBTL1EPHX1CA1CA2 | |
| Methacrylic Acid SCHEMBL27492395 | 0.81 | POLB (0.35) | POLBL3MBTL1EPHX1CA1CA2 | |
| Methacrylic Acid SCHEMBL2278907 | 0.81 | POLB (0.35) | POLBL3MBTL1EPHX1CA1CA2 | |
| Methacrylic Acid SCHEMBL5281945 | 0.80 | KMT2A (0.36) | POLBL3MBTL1 | |
| SCHEMBL27728764 | 0.79 | TDP1 (0.37) | TDP1POLBL3MBTL1PABPC1APOBEC3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117402362-A | Synthesis method of polymer containing selenoether group, product thereof and degradation method | 浙江大学 | 2024-01-16 | — | — | CN | claimed |
| EP-4634252-A1 | AQUEOUS COMPOSITIONS COMPRISING (METH)ACRYLATE GROUP CARRYING POLYURETHANE WHICH YIELD CROSS-LINKED LAYERS OF HIGH HARDNESS AND GOOD ADHESION | BASF SE (DE) | 2025-10-22 | — | — | EP | disclosed |
| WO-2025061511-A1 | TRI-FUNCTIONAL REACTIVE DILUENT FOR CURABLE COMPOSITIONS | BASF SE (DE) | 2025-03-27 | — | — | WO | disclosed |
| EP-4493608-A1 | RE-DISPERSIBLE OR RE-SOLUBLE AQUEOUS ETHYLENICALLY UNSATURATED AQUEOUS POLYURETHANE COMPOSITIONS WITH IMPROVED WATER-RESISTANCE | BASF SE (DE) | 2025-01-22 | — | — | EP | disclosed |
| WO-2024126304-A1 | AQUEOUS COMPOSITIONS COMPRISING (METH)ACRYLATE GROUP CARRYING POLYURETHANE WHICH YIELD CROSS-LINKED LAYERS OF HIGH HARDNESS AND GOOD ADHESION | BASF SE (DE) | 2024-06-20 | — | — | WO | disclosed |
| CN-117402362-A | Synthesis method of polymer containing selenoether group, product thereof and degradation method | 浙江大学 | 2024-01-16 | — | — | CN | disclosed |
| WO-2023174985-A1 | RE-DISPERSIBLE OR RE-SOLUBLE AQUEOUS ETHYLENICALLY UNSATURATED AQUEOUS POLYURETHANE COMPOSITIONS WITH IMPROVED WATER-RESISTANCE | BASF SE (DE) | 2023-09-21 | — | — | WO | disclosed |
| US-20090142622-A1 | MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20090011285-A1 | MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20070020490-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2007-01-25 | — | — | US | disclosed |
| US-20050282040-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2005-12-22 | — | — | US | disclosed |
| US-6936328-B2 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-30 | — | — | US | disclosed |
| US-6773789-B2 | A RADIATION-CURING RESIN UNDERCOATINGS ON A SUPPORT AND COVERING WITH A MAGNETIC FERROMAGNETIC POWDER LAYER; ELECTROMAGNETICS AND DURABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-10 | — | — | US | disclosed |
| US-20030180578-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2003-09-25 | — | — | US | disclosed |
| US-20030096139-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2003-05-22 | — | — | US | disclosed |