⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2401662 | 0.71 | — | — | |
| SCHEMBL302869 | 0.67 | — | — | |
| SCHEMBL28238354 | 0.62 | — | — | |
| SCHEMBL61444 | 0.62 | — | — | |
| SCHEMBL28321997 | 0.59 | — | — | |
| Ammonia Solution, Strong SCHEMBL7129274 | 0.59 | — | — | |
| SCHEMBL10452434 | 0.59 | — | — | |
| SCHEMBL301806 | 0.59 | — | — | |
| SCHEMBL7964200 | 0.54 | — | — | |
| Isobutane SCHEMBL9718508 | 0.54 | TSHR (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250160035-A1 | MANUFACTURING METHOD OF CIGS LIGHT ABSORPTION LAYER FOR SOLAR CELL USING CHEMICAL VAPOR DEPOSITION | MECAROENERGY CO., LTD. (KR) | 2025-05-15 | — | — | US | claimed |
| EP-4340047-A1 | METHOD FOR MANUFACTURING CIGS LIGHT ABSORPTION LAYER FOR SOLAR CELL THROUGH CHEMICAL VAPOR DEPOSITION | MECAROENERGY CO. LTD. (KR) | 2024-03-20 | — | — | EP | claimed |
| CN-117501455-A | Preparation method of CIGS light absorption layer for solar cell by chemical vapor deposition method | 马卡罗有限公司 | 2024-02-02 | — | — | CN | claimed |
| WO-2022240028-A1 | METHOD FOR MANUFACTURING CIGS LIGHT ABSORPTION LAYER FOR SOLAR CELL THROUGH CHEMICAL VAPOR DEPOSITION | 주식회사 메카로에너지 | 2022-11-17 | — | — | WO | claimed |
| CN-108541349-B | Solar cell including CIGS light-absorbing layer and method of manufacturing the same | 马卡罗能源有限公司 | 2021-06-22 | — | — | CN | claimed |
| US-10727366-B2 | Solar cell comprising CIGS light absorbing layer and method for manufacturing same | MECAROENERGY CO., LTD. (KR) | 2020-07-28 | — | — | US | claimed |
| US-20190157487-A1 | SOLAR CELL COMPRISING CIGS LIGHT ABSORBING LAYER AND METHOD FOR MANUFACTURING SAME | MECARO CO.,LTD. (KR) | 2019-05-23 | — | — | US | claimed |
| EP-3404725-A1 | SOLAR CELL COMPRISING CIGS LIGHT ABSORBING LAYER AND METHOD FOR MANUFACTURING SAME | Mecaro Co.,Ltd. (KR) | 2018-11-21 | — | — | EP | claimed |
| CN-108541349-A | Solar cell including CIGS light absorbing layers and its manufacturing method | 马卡罗有限公司 | 2018-09-14 | — | — | CN | claimed |
| WO-2011111889-A1 | METHOD FOR MANUFACTURING A CIGS THIN FILM | 주식회사 메카로닉스 (KR) | 2011-09-15 | — | — | WO | claimed |
| US-6861271-B2 | Forming indium nitride (InN) and indium gallium nitride (InGaN) quantum dots grown by metal-organic-vapor-phase-epitaxy (MOCVD) | THE NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2005-03-01 | — | — | US | claimed |
| US-20040023427-A1 | Forming indium nitride (InN) and indium gallium nitride (InGaN) quantum dots grown by metal-organic-vapor-phase-epitaxy (MOCVD) | UNIVERSITY OF SINGAPORE | 2004-02-05 | — | — | US | claimed |
| US-6645885-B2 | Forming indium nitride (InN) and indium gallium nitride (InGaN) quantum dots grown by metal-organic-vapor-phase-epitaxy (MOCVD) | THE NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2003-11-11 | — | — | US | claimed |
| US-20030059971-A1 | Forming indium nitride (InN) and indium gallium nitride (InGaN) quantum dots grown by metal-organic-vapor-phase-epitaxy (MOCVD) | NATIONAL UNIVERSITY OF SINGAPORE, THE (SG) | 2003-03-27 | — | — | US | claimed |
| EP-0658560-B1 | Process for removing oxygen-containing impurities in organo-gallium or -indium compounds | SUMITOMO CHEMICAL CO (JP) | 1999-10-20 | — | — | EP | claimed |
| US-5455364-A | Process for removing an impurity in organometallic compound | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 1995-10-03 | — | — | US | claimed |
| EP-0658560-A1 | Process for removing impurities in organometallic compounds | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1995-06-21 | — | — | EP | claimed |
| EP-0181706-B1 | HYBRID ORGANOMETALLIC COMPOUNDS OF IN AND BA AND PROCESS FOR METAL ORGANIC CHEMICAL VAPOUR DEPOSITION | MORTON THIOKOL, INC. (US) | 1989-11-15 | — | — | EP | claimed |
| US-4720560-A | Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition | MORTON THIOKOL, INC. (US) | 1988-01-19 | — | — | US | claimed |
| EP-0181706-A1 | Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition | MORTON THIOKOL, INC. (US) | 1986-05-21 | — | — | EP | claimed |