Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL7129274

CC[Ga](CC)CC.N

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28238354 0.94
SCHEMBL61444 0.94
SCHEMBL28212064 0.89
SCHEMBL28263862 0.89
SCHEMBL28321997 0.89
SCHEMBL10452435 0.89
SCHEMBL10452434 0.89
SCHEMBL7129275 0.89
SCHEMBL9838525 0.80
SCHEMBL6894777 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-208634793-U The collection device of triethyl-gallium 江苏南大光电材料股份有限公司 2019-03-22 CN disclosed
CN-109300853-A A kind of novel light-emitting diode Quantum Well and preparation method thereof 淮安澳洋顺昌光电技术有限公司 2019-02-01 CN disclosed
CN-108644612-A The collection device and its method of triethyl-gallium 江苏南大光电材料股份有限公司 2018-10-12 CN disclosed
EP-1061083-B1 Adduct of a dialkylgalliumazide with hydrazine for MOCVD of GaN KOREA RES INST CHEM TECH (KR) 2003-04-02 EP disclosed
US-6329540-B1 FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) PROCESS FOR FORMING A GALLIUM NITRIDE FILM ON SUBSTRATES KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2001-12-11 US disclosed
EP-1061083-A1 Adduct of a dialkylgalliumazide with hydrazine for MOCVD of GaN Korea Research Institute of Chemical Technology (KR) 2000-12-20 EP disclosed