⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2478505 | 0.71 | — | — | |
| SCHEMBL9185775 | 0.66 | CHRM2 (0.38) | — | |
| SCHEMBL8932089 | 0.63 | — | — | |
| SCHEMBL8049997 | 0.61 | — | — | |
| SCHEMBL8049996 | 0.61 | — | — | |
| SCHEMBL222498 | 0.60 | — | — | |
| SCHEMBL6629586 | 0.59 | — | — | |
| SCHEMBL15105779 | 0.59 | — | — | |
| SCHEMBL5345064 | 0.58 | DGAT1 (0.36) | — | |
| SCHEMBL7521173 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8198370-B2 | Coated substrate | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-06-12 | — | — | US | disclosed |
| US-20090198016-A1 | Coated Substrate | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-08-06 | — | — | US | disclosed |
| US-6376230-B1 | Stereoselective process for producing intermediates of cryptophycins | ELI LILLY AND COMPANY | 2002-04-23 | — | — | US | disclosed |
| WO-1998038158-A1 | PROCESS FOR PREPARING PHARMACEUTICAL COMPOUNDS | ELI LILLY AND COMPANY (US) | 1998-09-03 | — | — | WO | disclosed |
| EP-0861838-A2 | Process and intermediates for preparing cryptophycin compounds | ELI LILLY AND COMPANY (US) | 1998-09-02 | — | — | EP | disclosed |
| EP-0556650-B1 | Amine-containing block polymers for pigmented ink jet inks | DU PONT (US) | 1995-06-07 | — | — | EP | disclosed |
| US-5272201-A | Amine-containing block polymers for pigmented ink jet inks | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-12-21 | — | — | US | disclosed |
| EP-0556650-A1 | Amine-containing block polymers for pigmented ink jet inks | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-25 | — | — | EP | disclosed |
| EP-0524246-A1 | RESIST MATERIAL AND PROCESS FOR USE. | DU PONT (US) | 1993-01-27 | — | — | EP | disclosed |
| US-5064898-A | Room temperature-curable organopolysiloxane composition and method for the preparation thereof | SHIN-ETSU CHEMICAL CO. (JP) | 1991-11-12 | — | — | US | disclosed |
| WO-1991015810-A1 | RESIST MATERIAL AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| US-4985332-A | Resist material with carbazole diazonium salt acid generator and process for use | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-15 | — | — | US | disclosed |