Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | FDPS | P14324 | 10/20 | 0.53 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | PGK1 | P00558 | 1/20 | 0.42 |
| ▸ | PGK2 | P07205 | 1/20 | 0.42 |
| ▸ | GRM4 | Q14833 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | GGPS1 | O95749 | 3/20 | 0.32 |
| ▸ | SLC34A1 | Q06495 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7256888 | 0.85 | LMNA (0.50) | LMNAFDPSCA2PGK1PGK2 | |
| SCHEMBL335957 | 0.78 | — | — | |
| SCHEMBL27006289 | 0.75 | LMNA (0.56) | LMNAFDPSCA2PGK1PGK2 | |
| Hydrochloric Acid SCHEMBL9775705 | 0.75 | LMNA (0.56) | LMNAFDPSCA2PGK1PGK2 | |
| SCHEMBL97568 | 0.75 | LMNA (0.56) | LMNAFDPSCA2PGK1PGK2 | |
| SCHEMBL4649888 | 0.75 | — | — | |
| SCHEMBL21382633 | 0.75 | — | — | |
| SCHEMBL134918 | 0.75 | — | — | |
| Phosphoric Acid SCHEMBL28215683 | 0.73 | LMNA (0.53) | LMNAFDPSCA2PGK1PGK2 | |
| Phosphoric Acid SCHEMBL28095308 | 0.73 | LMNA (0.53) | LMNAFDPSCA2PGK1PGK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113817410-B | Concentrate of polishing composition and polishing method using same | 福吉米株式会社 | 2024-05-10 | — | — | CN | claimed |
| CN-113710761-B | Surface coated abrasive particles for tungsten polishing applications | CMC材料有限责任公司 | 2024-04-09 | — | — | CN | claimed |
| CN-117551392-A | Silicon wafer polishing composition and application thereof | 万华化学集团电子材料有限公司 | 2024-02-13 | — | — | CN | claimed |
| CN-116804133-A | Highly hydrophilic polishing composition and preparation method and application thereof | 万华化学集团电子材料有限公司 | 2023-09-26 | — | — | CN | claimed |
| CN-115386300-B | Polishing composition suitable for silicon wafer regeneration, preparation method and application thereof | 万华化学集团电子材料有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-116640515-A | Silicon wafer polishing composition and application thereof | 万华化学集团电子材料有限公司 | 2023-08-25 | — | — | CN | claimed |
| CN-115785819-A | Silicon wafer polishing composition and application thereof | 万华化学集团电子材料有限公司 | 2023-03-14 | — | — | CN | claimed |
| CN-115386300-A | Polishing composition suitable for silicon wafer regeneration, preparation method and application thereof | 万华化学集团电子材料有限公司 | 2022-11-25 | — | — | CN | claimed |
| EP-3413934-B1 | IMPROVED TREATMENT OF IMPLANTS WITH PHOSPHONIC ACID COMPOUNDS | NANO BRIDGING MOLECULES SA (CH) | 2021-10-13 | — | — | EP | claimed |
| CN-109195641-B | Improved implant treatment with phosphonic acid compounds | 纳米桥接分子股份公司 | 2021-07-27 | — | — | CN | claimed |
| US-11000627-B2 | Treatment of implants with phosphonic acid compounds | NANO BRIDGING MOLECULES SA (CH) | 2021-05-11 | — | — | US | claimed |
| US-20190038802-A1 | IMPROVED TREATMENT OF IMPLANTS WITH PHOSPHONIC ACID COMPOUNDS | NANO BRIDGING MOLECULES SA (CH) | 2019-02-07 | — | — | US | claimed |
| US-4304847-A | ALKALINE DEVELOPING SOLUTION CONTAINING A STANNOUS SALT, A DYE, AND A BIS/PYRIDINIUM COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1981-12-08 | — | — | US | claimed |
| US-4258127-A | PHOTOGRAPHY, FOGGING | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-24 | — | — | US | claimed |
| US-4146397-A | Method of forming a photographic image | FUJI PHOTO FILM CO., LTD. (JP) | 1979-03-27 | — | — | US | claimed |
| US-3997348-A | FERRIC SALT BLEACHING SOLUTION | FUJI PHOTO FILM CO., LTD. (JA) | 1976-12-14 | — | — | US | claimed |
| CN-118216520-A | Antibacterial/antiviral composition, antibacterial/antiviral fabric, and antibacterial/antiviral film | DIC株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118043027-A | Process for dyeing and/or lightening keratin fibres | 莱雅公司 | 2024-05-14 | — | — | CN | disclosed |
| US-3997348-A | FERRIC SALT BLEACHING SOLUTION | FUJI PHOTO FILM CO., LTD. (JA) | 1976-12-14 | — | — | US | disclosed |
| US-3951665-A | Direct-positive silver halide emulsion fogged with a tin (II) chelate | CIBA-GEIGY AG (CH) | 1976-04-20 | — | — | US | disclosed |