SCHEMBL4157589

SCHEMBL4157589

FC(F)(F)C1=C([Ru]C2=C(C(F)(F)F)C=CC2)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9576928 0.68
SCHEMBL8741773 0.68
SCHEMBL4598381 0.67
SCHEMBL3837729 0.65
SCHEMBL4577265 0.65
SCHEMBL4873924 0.65
SCHEMBL3837732 0.65
SCHEMBL7172997 0.64
Hydrochloric Acid SCHEMBL7548955 0.62
SCHEMBL74400 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020255822-A1 RUTHENIUM COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, AND METHOD FOR FORMING THIN FILM 株式会社ADEKA 2020-12-24 WO disclosed
US-20090022891-A1 METHOD OF FORMING METAL FILM JSR CORPORATION (JP) 2009-01-22 US disclosed
EP-1995347-A1 METHOD OF FORMING METAL FILM JSR Corporation (JP) 2008-11-26 EP disclosed
US-7238822-B2 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2007-07-03 US disclosed
US-20060240190-A1 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2006-10-26 US disclosed