Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 2/20 | 0.37 |
| ▸ | GPR3 | P46089 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 2/20 | 0.32 |
| ▸ | TAS2R14 | Q9NYV8 | 1/20 | 0.32 |
| ▸ | MAOB | P27338 | 1/20 | 0.32 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | CTBP2 | P56545 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3480268 | 0.86 | MAOB (0.46) | MEN1KMT2ATAS2R14MAOBCA2 | |
| SCHEMBL758837 | 0.85 | ESR1 (0.39) | MEN1KMT2AKEAP1ESR1MAOB | |
| SCHEMBL29561503 | 0.85 | ESR1 (0.39) | MEN1KMT2AKEAP1ESR1MAOB | |
| Trifluoromethanesulfonic Acid SCHEMBL4165796 | 0.84 | KCNH2 (0.37) | KCNH2MEN1KMT2ACA2ATM | |
| Hydrochloric Acid SCHEMBL9331155 | 0.83 | ESR1 (0.38) | MEN1KMT2AKEAP1ESR1MAOB | |
| Trifluoromethanesulfonic Acid SCHEMBL1741775 | 0.83 | KCNH2 (0.41) | KCNH2GPR3ESR1TAS2R14 | |
| SCHEMBL30217958 | 0.82 | ESR1 (0.36) | MEN1KMT2AKEAP1ESR1MAOB | |
| SCHEMBL29843345 | 0.82 | ESR1 (0.36) | MEN1KMT2AKEAP1ESR1MAOB | |
| SCHEMBL29819556 | 0.82 | ESR1 (0.36) | MEN1KMT2AKEAP1ESR1MAOB | |
| SCHEMBL30423338 | 0.82 | ESR2 (0.36) | MEN1KMT2AKEAP1ESR1MAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12434998-B2 | Resin-coated ultra-thin glass | TORAY INDUSTRIES, INC. (JP) | 2025-10-07 | — | — | US | disclosed |
| CN-116648353-B | Resin coated ultra-thin plate glass and display device | 东丽株式会社 | 2025-01-21 | — | — | CN | disclosed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024057999-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, DISPLAY DEVICE AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2024-03-21 | — | — | WO | disclosed |
| WO-2023210418-A1 | THERMOSETTING COMPOSITION, CURED PRODUCT, AND OPTICAL MEMBER | 富士フイルム株式会社 | 2023-11-02 | — | — | WO | disclosed |
| WO-2023032746-A1 | COMPOSITION, CURED FILM, STRUCTURE, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| EP-4130087-A1 | STEREOISOMER OF EPOXY COMPOUND, CURABLE COMPOSITION CONTAINING SAME, AND CURED OBJECT OBTAINED BY CURING CURABLE COMPOSITION | ENEOS Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |
| WO-2022163191-A1 | RESIN-COATED ULTRA-THIN GLASS | 東レ株式会社 | 2022-08-04 | — | — | WO | disclosed |
| EP-3203320-B9 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TORAY INDUSTRIES (JP) | 2020-05-06 | — | — | EP | disclosed |
| WO-2020045214-A1 | RESIN COMPOSITION AND CURED FILM OBTAINED THEREFROM | 東レ株式会社 | 2020-03-05 | — | — | WO | disclosed |
| EP-2799928-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT | TORAY INDUSTRIES (JP) | 2019-05-22 | — | — | EP | disclosed |
| EP-1942150-B1 | SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | TORAY INDUSTRIES (JP) | 2018-08-22 | — | — | EP | disclosed |
| US-20170285477-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TORAY INDUSTRIES, INC. (JP) | 2017-10-05 | — | — | US | disclosed |
| EP-3203320-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Toray Industries, Inc. (JP) | 2017-08-09 | — | — | EP | disclosed |
| US-9704724-B2 | Photosensitive resin composition and method for producing semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2017-07-11 | — | — | US | disclosed |
| EP-2799928-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT | Toray Industries, Inc. (JP) | 2014-11-05 | — | — | EP | disclosed |
| US-20140242787-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | TORAY INDUSTRIES, INC. (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20120237873-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM | TORAY INDUSTRIES INC. (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20090105360-A1 | SILOXANE RESIN COMPOSITION AND PRODUCTION METHOD THEREOF | TORAY INDUSTRIES, INC. (JP) | 2009-04-23 | — | — | US | disclosed |
| EP-1942150-A1 | SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | TORAY INDUSTRIES, INC. (JP) | 2008-07-09 | — | — | EP | disclosed |