Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 2/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.39 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.37 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | DRD2 | P14416 | 1/20 | 0.33 |
| ▸ | DRD1 | P21728 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | CTBP2 | P56545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.33 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29561503 | 1.00 | ESR1 (0.39) | ESR1ESR2KEAP1MAOBTAAR1 | |
| Hydrochloric Acid SCHEMBL9331155 | 0.98 | ESR1 (0.38) | ESR1ESR2KEAP1MAOBTAAR1 | |
| SCHEMBL30423338 | 0.94 | ESR2 (0.36) | ESR1ESR2KEAP1MAOBTAAR1 | |
| SCHEMBL30217958 | 0.94 | ESR1 (0.36) | ESR1ESR2KEAP1MAOBTAAR1 | |
| SCHEMBL29843345 | 0.94 | ESR1 (0.36) | ESR1ESR2KEAP1MAOBTAAR1 | |
| SCHEMBL29819556 | 0.94 | ESR1 (0.36) | ESR1ESR2KEAP1MAOBTAAR1 | |
| SCHEMBL2233590 | 0.86 | SHBG (0.32) | ESR1ESR2KEAP1MAOBSHBG | |
| SCHEMBL4545351 | 0.85 | KMT2A (0.40) | MAOBTAAR1MEN1ALDH1A1MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL4167370 | 0.85 | KCNH2 (0.37) | ESR1KEAP1MAOBGPR84MEN1 | |
| SCHEMBL29561234 | 0.82 | ESR2 (0.30) | ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024237033-A1 | COMPOSITION FOR SEMICONDUCTOR DEVICE PROCESSING AND METHOD FOR PRODUCING MODIFIED SUBSTRATE | 富士フイルム株式会社 | 2024-11-21 | — | — | WO | disclosed |
| US-11649365-B2 | Ink, ink set, ink container, method of printing, and printing device | RICOH COMPANY, LTD. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11649365-B2 | Ink, ink set, ink container, method of printing, and printing device | RICOH COMPANY, LTD. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11422464-B2 | Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display | TORAY INDUSTRIES, INC. (JP) | 2022-08-23 | — | — | US | disclosed |
| US-11370751-B2 | Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof | SAN APRO LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| US-20220017764-A1 | INK, INK SET, INK CONTAINER, METHOD OF PRINTING, AND PRINTING DEVICE | RICOH COMPANY, LTD. (JP) | 2022-01-20 | — | — | US | disclosed |
| US-11194252-B2 | Cured film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2021-12-07 | — | — | US | disclosed |
| US-11127698-B2 | Method for producing conductive film, method for producing field effect transistor using same, and method for producing wireless communication device | TORAY INDUSTRIES, INC. (JP) | 2021-09-21 | — | — | US | disclosed |
| WO-2021095766-A1 | COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE, AND POLYMER | JSR株式会社 | 2021-05-20 | — | — | WO | disclosed |
| WO-2020250783-A1 | COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND POLYMER | JSR株式会社 | 2020-12-17 | — | — | WO | disclosed |
| US-20110008730-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM | JSR CORPORATION (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100273109-A1 | METHOD FOR PRODUCING OPTICAL PART | CANON KABUSHIKI KAISHA (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2243622-A2 | Method for producing optical part | CANON KABUSHIKI KAISHA (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2239301-A1 | SILOXANE RESIN COMPOSITIONS | Toray Industries, Inc. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100193228-A1 | EPOXY RESIN COMPOSITION | SONY CHEMICAL & INFORMATION DEVICE CORPORATION (JP) | 2010-08-05 | — | — | US | disclosed |
| US-20100129618-A1 | PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM | TORAY INDUSTRIES, INC. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-7374856-B2 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060115766-A1 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2006-06-01 | — | — | US | disclosed |
| EP-1662322-A2 | Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film | TORAY INDUSTRIES, INC. (JP) | 2006-05-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11370751-B2 | Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof | TST, MPST, ASIC1 | ESR1 2503/4885ESR2 3297/4885KEAP1 4248/4885 |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | ICAM1, ESD, CAD | ESR1 789/4885ESR2 2412/4885KEAP1 2305/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.