⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4764561 | 1.00 | — | — | |
| SCHEMBL931502 | 0.89 | — | — | |
| SCHEMBL931354 | 0.89 | — | — | |
| SCHEMBL930298 | 0.85 | — | — | |
| SCHEMBL929546 | 0.85 | — | — | |
| SCHEMBL472954 | 0.77 | — | — | |
| SCHEMBL4771759 | 0.77 | — | — | |
| SCHEMBL3343490 | 0.74 | — | — | |
| SCHEMBL31351426 | 0.74 | — | — | |
| SCHEMBL27871174 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8199404-B2 | Anti-reflection coating, optical member, exchange lens unit and imaging device | Pentax Ricoh Imaging Company, Ltd. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090168184-A1 | ANTI-REFLECTION COATING, OPTICAL MEMBER, EXCHANGE LENS UNIT AND IMAGING DEVICE | HOYA CORPORATION (JP) | 2009-07-02 | — | — | US | disclosed |
| EP-1832351-B1 | Low dielectric materials and methods for making same | AIR PROD & CHEM (US) | 2008-11-12 | — | — | EP | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| EP-1837086-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-26 | — | — | EP | disclosed |
| EP-1832351-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-12 | — | — | EP | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20050260420-A1 | Low dielectric materials and methods for making same | VERSUM MATERIALS US, LLC | 2005-11-24 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |