Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.51 |
| ▸ | SLC2A1 | P11166 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.46 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.46 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.46 |
| ▸ | HTR2B | P41595 | 1/20 | 0.46 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.46 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1173472 | 0.95 | CYP3A4 (0.53) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL29671499 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL30876958 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL6931173 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL7520068 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL179760 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL8770368 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL727321 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| SCHEMBL10885117 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A | |
| Dodecane SCHEMBL28229207 | 0.93 | LMNA (0.55) | CYP1A2CYP2C9CYP2C19SLC2A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0443742-B1 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1997-10-01 | — | — | EP | claimed |
| US-5476754-A | Presensitized; hydrophilic surface on substrate; light sensitive layer containing alkaline water-soluble photocrosslinkable copolycondensed diazo resin | FUJI PHOTO FILM CO., LTD. (JP) | 1995-12-19 | — | — | US | claimed |
| EP-0443742-A2 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | claimed |
| WO-2022255400-A1 | CLEANER FOR INDOOR WATER USE SITES | 住友化学株式会社 | 2022-12-08 | — | — | WO | disclosed |
| CN-105849638-B | Active light-sensitive or radiation-sensitive resin composition and film | 富士胶片株式会社 | 2020-07-07 | — | — | CN | disclosed |
| CN-105900013-B | Active light-sensitive or radiation-sensitive resin composition and film | 富士胶片株式会社 | 2019-12-24 | — | — | CN | disclosed |
| US-10394127-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| EP-3106920-B1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-10336859-B2 | Method for preparing an electrolyte capacitor | TAYCA CORPORATION (JP) | 2019-07-02 | — | — | US | disclosed |
| US-20190106531-A1 | Method for preparing an electrolyte capacitor | TAYCA CORPORATION (JP) | 2019-04-11 | — | — | US | disclosed |
| US-10208160-B2 | Oxidant dopant agent for conductive polymer production, and a solution thereof, and a conductive polymer prepared by using either of them, as well as an electrolyte capacitor using the conductive polymer as an electrolyte | TAYCA CORPORATION (JP) | 2019-02-19 | — | — | US | disclosed |
| EP-0399755-B1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | FUJI PHOTO FILM CO LTD (JP) | 1994-03-30 | — | — | EP | disclosed |
| US-5250393-A | Containing diazo resin and alkali metal or ammonium silicate | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0530815-A1 | Presensitized plate for use in making lithographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 1993-03-10 | — | — | EP | disclosed |
| EP-0492959-A1 | Method for developing presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1992-07-01 | — | — | EP | disclosed |
| EP-0487343-A1 | Process for preparing a lithographic plate | Fuji Photo Film Co., Ltd. (JP) | 1992-05-27 | — | — | EP | disclosed |
| US-5112743-A | Aromatic-aldehyde diazo resins | FUJI PHOTO FILM CO., LTD. (JP) | 1992-05-12 | — | — | US | disclosed |
| EP-0443742-A2 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |
| EP-0415422-A2 | Method for forming images | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-06 | — | — | EP | disclosed |
| EP-0399755-A1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | Fuji Photo Film Co., Ltd. (JP) | 1990-11-28 | — | — | EP | disclosed |