⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Urea SCHEMBL30111758 | 0.78 | — | — | |
| Urea SCHEMBL187990 | 0.78 | — | — | |
| Urea SCHEMBL411583 | 0.78 | — | — | |
| Urea SCHEMBL7756359 | 0.78 | LMNA (1.00) | — | |
| Urea C 13 SCHEMBL12476878 | 0.78 | — | — | |
| Urea SCHEMBL8560069 | 0.78 | LMNA (1.00) | — | |
| Urea SCHEMBL8436158 | 0.78 | LMNA (1.00) | — | |
| Urea SCHEMBL8434002 | 0.78 | LMNA (1.00) | — | |
| Urea SCHEMBL20641124 | 0.78 | LMNA (1.00) | — | |
| Urea SCHEMBL29541638 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117511405-A | Functional protective coating and preparation method thereof | 中国科学院兰州化学物理研究所 | 2024-02-06 | — | — | CN | claimed |
| CN-117186774-A | High-temperature radiation refrigeration coating with protection function and preparation method thereof | 中国科学院兰州化学物理研究所 | 2023-12-08 | — | — | CN | claimed |
| CN-113497361-B | Patterned SiC microstructure and application thereof | 东莞理工学院 | 2023-10-13 | — | — | CN | claimed |
| CN-103403112-B | Composition for forming low refractive index film, method for forming low refractive index film, low refractive index film formed by the method, and antireflection film | 默克专利有限公司 | 2016-06-22 | — | — | CN | claimed |
| CN-103403112-A | Composition for forming low refractive index film, method for forming low refractive index film, low refractive index film formed by the method, and antireflection film | AZ ELECTRONIC MATERIALS IP JAPAN K K | 2013-11-20 | — | — | CN | claimed |
| CN-100390970-C | Method and structure to enhance temperature/humidity/bias performance of semiconductor devices by surface modification | IBM (US) | 2008-05-28 | — | — | CN | claimed |
| CN-100349732-C | Thermally stable, moisture curable polysilazanes and polysiloxazanes | KION CORP (CH) | 2007-11-21 | — | — | CN | claimed |
| EP-1412445-B1 | POLYSILAZANE-MODIFIED POLYAMINE HARDENERS FOR EPOXY RESINS | CLARIANT FINANCE BVI LTD (VG) | 2007-10-31 | — | — | EP | claimed |
| CN-1695242-A | Method and structure to enhance temperature/humidity/bias performance of semiconductor devices by surface modification | IBM (US) | 2005-11-09 | — | — | CN | claimed |
| CN-1630578-A | Thermally stable, moisture curable polysilazanes and polysiloxazanes | KION CORP (US) | 2005-06-22 | — | — | CN | claimed |
| EP-1412445-A4 | POLYSILAZANE-MODIFIED POLYAMINE HARDENERS FOR EPOXY RESINS | KION CORP (US) | 2004-10-27 | — | — | EP | claimed |
| US-6756469-B2 | POLYSILAZANE MOIETY OF SAID POLYSILAZANE-MODIFIED POLYAMINE IS CHARACTERIZED BY REPEATING UNITS OF SILICON-NITROGEN LINKAGES AND CONTAINING REDUCED AMOUNT OF SILICON-HYDROGEN BONDS | KION CORPORATION | 2004-06-29 | — | — | US | claimed |
| EP-1412445-A1 | POLYSILAZANE-MODIFIED POLYAMINE HARDENERS FOR EPOXY RESINS | Kion Corporation (US) | 2004-04-28 | — | — | EP | claimed |
| US-20030045635-A1 | Polysilazane-modified polyamine hardeners for epoxy resins | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) | 2003-03-06 | — | — | US | claimed |
| WO-2003008514-A1 | POLYSILAZANE-MODIFIED POLYAMINE HARDENERS FOR EPOXY RESINS | KION CORPORATION (US) | 2003-01-30 | — | — | WO | claimed |
| WO-1998051981-A1 | GLASS FIBER REINFORCED CERAMIC MOLDING COMPOSITIONS | OWENS CORNING (US) | 1998-11-19 | — | — | WO | claimed |
| CN-118251281-A | Alloy composition | 赫格纳斯公司 | 2024-06-25 | — | — | CN | disclosed |
| US-11993546-B2 | Ceramic matrix composites, and methods and systems for making same | LANCER SYSTEMS LP (US) | 2024-05-28 | — | — | US | disclosed |
| US-20030045635-A1 | Polysilazane-modified polyamine hardeners for epoxy resins | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) | 2003-03-06 | — | — | US | disclosed |
| WO-2003008514-A1 | POLYSILAZANE-MODIFIED POLYAMINE HARDENERS FOR EPOXY RESINS | KION CORPORATION (US) | 2003-01-30 | — | — | WO | disclosed |