SCHEMBL4177813

SCHEMBL4177813

[CH2]CNC(=O)CCCCCCCCCCCCCCC

nearest known ligand 0.69

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
FAAH O00519 8/20 0.69
HSP90AA1 P07900 1/20 0.59
DNM1 Q05193 2/20 0.56
CASP2 P42575 1/20 0.55
MEN1 O00255 1/20 0.53
MAPK1 P28482 1/20 0.53
KMT2A Q03164 1/20 0.53
NAAA Q02083 1/20 0.52
EPHX2 P34913 1/20 0.51
CES2 O00748 3/20 0.50
CES1 P23141 3/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3907996 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL9469574 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL9251708 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL9471032 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL4165911 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL5891950 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL9034010 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL15058976 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL1029118 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1
SCHEMBL11720611 1.00 FAAH (0.69) FAAHHSP90AA1DNM1CASP2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0316618-B1 Multilayer flat light sensitive registration material BASF AG (DE) 1994-08-17 EP claimed
US-20240117177-A1 NON-FLUORINATED BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2024-04-11 US disclosed
WO-2024075801-A1 POLYMER AND WATER-REPELLENT OILPROOF COMPOSITION ダイキン工業株式会社 2024-04-11 WO disclosed
EP-4177396-A1 SURFACE TREATMENT AGENT COMPRISING A NON-FLUORINATED BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2023-05-10 EP disclosed
WO-2021195555-A1 PALMITOYLETHANOLAMIDE COMPOUNDS TRAVECTA THERAPEUTICS, PTE. LTD. (SG) 2021-09-30 WO disclosed
EP-3858881-A1 NON-FLUORINATED BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2021-08-04 EP disclosed
US-20210214545-A1 NON-FLUORINATED BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2021-07-15 US disclosed
CN-112437783-A Non-fluorine block copolymer 大金工业株式会社 2021-03-02 CN disclosed
CN-102046007-B Comprise agriculturally active ingredients through stable O/w emulsion 陶氏益农公司 2016-10-26 CN disclosed
CN-105916484-A Hair conditioning composition comprising a zwitterion or proteincaeous material 荷兰联合利华有限公司 2016-08-31 CN disclosed
EP-0463485-A2 Process for the production of flexographic relief printing plates BASF Aktiengesellschaft (DE) 1992-01-02 EP disclosed
EP-0168719-B1 LOW PH HAIR CONDITIONER COMPOSITIONS CONTAINING AMINE OXIDES Revlon, Inc. (US) 1991-10-30 EP disclosed
EP-0133905-B1 LOW PH HAIR CONDITIONER AND NEUTRALIZER CONDITIONING COMPOSITIONS CONTAINING AMINE OXIDES Revlon, Inc. (US) 1991-09-18 EP disclosed
US-5035981-A Having a top layer of high-strength, transparent, soluble or swellable polymer containing an antistatic agent of an ethoxylated amine or amide; exposure; development BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US disclosed
US-4986983-A IMPROVING TEXTURE, FEEL AND APPEARANCE REVLON, INC. (US) 1991-01-22 US disclosed
US-4946758-A RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING BASF AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed
EP-0316618-A2 Multilayer flat light sensitive registration material BASF Aktiengesellschaft (DE) 1989-05-24 EP disclosed
US-4714610-A ANTISTATIC AGENTS REVLON, INC. (US) 1987-12-22 US disclosed
EP-0168719-A2 Low pH hair conditioner compositions containing amine oxides Revlon, Inc. (US) 1986-01-22 EP disclosed
EP-0133905-A2 Low pH hair conditioner and neutralizer conditioning compositions containing amine oxides Revlon, Inc. (US) 1985-03-13 EP disclosed