SCHEMBL417802

SCHEMBL417802

[c]1cccc2[c]c3ccccc3cc12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11674210 0.83 CYP2A6 (0.31)
SCHEMBL17044573 0.81
SCHEMBL102590 0.81 CYP2A6 (0.39)
SCHEMBL756551 0.81 CYP2A6 (0.32)
SCHEMBL17044576 0.81
SCHEMBL18832 0.79 ALDH1A1 (0.36)
SCHEMBL17044623 0.78
SCHEMBL24252 0.78 CYP2A6 (0.41)
SCHEMBL25147 0.77 ALDH1A1 (0.39)
SCHEMBL15366695 0.77 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210069963-A1 METHOD FOR MANUFACTURING A THREE-DIMENSIONAL OBJECT SOLVAY SPECIALITY POLYMERS USA, LLC 2021-03-11 US claimed
CN-111479874-A Method for producing a three-dimensional object 索尔维特殊聚合物美国有限责任公司 2020-07-31 CN claimed
US-7534370-B2 Polymerizable liquid crystal composition, optical anisotropic material, optical element and optical head device ASAHI GLASS COMPANY, LIMITED (JP) 2009-05-19 US claimed
US-20080048149-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, OPTICAL ANISOTROPIC MATERIAL, OPTICAL ELEMENT AND OPTICAL HEAD DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2008-02-28 US claimed
EP-1873228-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, OPTICAL ANISOTROPIC MATERIAL, OPTICAL ELEMENT, AND OPTICAL HEAD DEVICE Asahi Glass Company, Limited (JP) 2008-01-02 EP claimed
WO-2023162653-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION 日産化学株式会社 2023-08-31 WO disclosed
US-11654615-B2 Method for manufacturing a three-dimensional object SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2023-05-23 US disclosed
CN-109963922-B Aldehyde scavenger and method for removing aldehyde 东曹株式会社 2022-09-23 CN disclosed
CN-113574092-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, pattern formation method, and purification method 三菱瓦斯化学株式会社 2021-10-29 CN disclosed
US-20210069963-A1 METHOD FOR MANUFACTURING A THREE-DIMENSIONAL OBJECT SOLVAY SPECIALITY POLYMERS USA, LLC 2021-03-11 US disclosed
WO-2020189712-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD 三菱瓦斯化学株式会社 2020-09-24 WO disclosed
CN-111479874-A Method for producing a three-dimensional object 索尔维特殊聚合物美国有限责任公司 2020-07-31 CN disclosed
US-5565543-A Rigid-rod polymers MAXDEM INCORPORATED (US) 1996-10-15 US disclosed
US-5227457-A Rigid-rod polymers MAXDEM INCORPORATED (US) 1993-07-13 US disclosed
EP-0489085-A4 RIGID-ROD POLYMERS MAXDEM INC (US) 1992-08-05 EP disclosed
EP-0489085-A1 RIGID-ROD POLYMERS MAXDEM INCORPORATED (US) 1992-06-10 EP disclosed
EP-0401296-A4 RIGID-ROD POLYMERS MAXDEM INC (US) 1992-03-18 EP disclosed
WO-1991002764-A1 RIGID-ROD POLYMERS MAXDEM INCORPORATED (US) 1991-03-07 WO disclosed
EP-0401296-A1 RIGID-ROD POLYMERS MAXDEM INCORPORATED (US) 1990-12-12 EP disclosed
WO-1989007617-A1 RIGID-ROD POLYMERS MAXDEM INCORPORATED (US) 1989-08-24 WO disclosed