Butadiene

Butadiene

SCHEMBL4181280

C=CC=C.C=CC=CCC

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butadiene SCHEMBL4181277 1.00 TRPA1 (0.45) TRPA1
SCHEMBL22111 0.97
SCHEMBL1760692 0.97
SCHEMBL22112 0.97
SCHEMBL23650043 0.93
Ammonia Solution, Strong SCHEMBL11663243 0.93
Bromide SCHEMBL28453923 0.93
SCHEMBL23650044 0.93
SCHEMBL11246643 0.93
Methane SCHEMBL19112338 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11043375-B2 Plasma deposition of carbon hardmask APPLIED MATERIALS, INC. (US) 2021-06-22 US disclosed
US-20190228970-A1 DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS APPLIED MATERIALS, INC. 2019-07-25 US disclosed
EP-3475971-A1 DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS Applied Materials, Inc. (US) 2019-05-01 EP disclosed
US-10249495-B2 Diamond like carbon layer formed by an electron beam plasma process APPLIED MATERIALS, INC. (US) 2019-04-02 US disclosed
US-20190057862-A1 PLASMA DEPOSITION OF CARBON HARDMASK APPLIED MATERIALS, INC. 2019-02-21 US disclosed
US-10128337-B2 Methods for forming fin structures with desired profile for 3D structure semiconductor applications APPLIED MATERIALS, INC. (US) 2018-11-13 US disclosed
US-20170372899-A1 DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS APPLIED MATERIALS, INC. 2017-12-28 US disclosed
US-20170352726-A1 METHODS FOR FORMING FIN STRUCTURES WITH DESIRED PROFILE FOR 3D STRUCTURE SEMICONDUCTOR APPLICATIONS APPLIED MATERIALS, INC. 2017-12-07 US disclosed
US-20150371851-A1 AMORPHOUS CARBON DEPOSITION PROCESS USING DUAL RF BIAS FREQUENCY APPLICATIONS APPLIED MATERIALS, INC. 2015-12-24 US disclosed
US-20150228463-A1 CLEANING PROCESS FOR CLEANING AMORPHOUS CARBON DEPOSITION RESIDUALS USING LOW RF BIAS FREQUENCY APPLICATIONS APPLIED MATERIALS, INC. 2015-08-13 US disclosed
US-20140273461-A1 CARBON FILM HARDMASK STRESS REDUCTION BY HYDROGEN ION IMPLANTATION APPLIED MATERIALS, INC. (US) 2014-09-18 US disclosed
US-20140263173-A1 METHODS FOR IMPROVING ETCHING RESISTANCE FOR AN AMORPHOUS CARBON FILM APPLIED MATERIALS, INC. (US) 2014-09-18 US disclosed
US-20090093128-A1 METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER APPLIED MATERIALS, INC. 2009-04-09 US disclosed
US-5212238-A Impact strength FERRO CORPORATION (US) 1993-05-18 US disclosed
US-5122569-A Impact strength, heat deflection FERRO CORPORATION (US) 1992-06-16 US disclosed
EP-0375389-A1 Toughened compositions of polyamide and functionalized rubber block or graft copolymers FERRO CORPORATION (US) 1990-06-27 EP disclosed
EP-0375390-A1 Toughened polyamide compositions having improved properties FERRO CORPORATION (US) 1990-06-27 EP disclosed
US-4339506-A A THIURAM Martin, Chloeta F. (US) 1982-07-13 US disclosed
US-4215178-A FLUORINE-CONTAINING POLYMER, NATURAL RUBBER, DIENE POLYMER AND A VINYL AROMATIC POLYMER Martin, Chloeta F. (US) 1980-07-29 US disclosed
US-4115614-A RUBBER Martin, Chloeta F. (US) 1978-09-19 US disclosed