Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.69 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.69 |
| ▸ | MEN1 | O00255 | 4/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.56 |
| ▸ | MAPT | P10636 | 4/20 | 0.56 |
| ▸ | POLB | P06746 | 3/20 | 0.56 |
| ▸ | NPC1 | O15118 | 2/20 | 0.56 |
| ▸ | RAB9A | P51151 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | LMNA | P02545 | 4/20 | 0.50 |
| ▸ | CES2 | O00748 | 1/20 | 0.50 |
| ▸ | CES1 | P23141 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.49 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9424415 | 0.86 | ALDH1A1 (0.65) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL3413576 | 0.85 | ALDH1A1 (0.73) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL28219066 | 0.85 | ALDH1A1 (0.73) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL29179759 | 0.84 | ALDH1A1 (0.50) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL28491005 | 0.83 | ALDH1A1 (0.71) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL343011 | 0.83 | MAPT (0.77) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL7148678 | 0.82 | MEN1 (0.58) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL722642 | 0.82 | CYP2D6 (0.48) | ALDH1A1CYP3A4KMT2ASMN1; SMN2LMNA | |
| SCHEMBL17491377 | 0.82 | SMN1; SMN2 (0.48) | ALDH1A1CYP3A4KMT2ASMN1; SMN2LMNA | |
| SCHEMBL159213 | 0.82 | ALDH1A1 (0.69) | ALDH1A1CYP3A4MEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 453 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4636808-A1 | PEELING AGENT COMPOSITION FOR PHOTOIRRADIATION-BASED PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER | Nissan Chemical Corporation (JP) | 2025-10-22 | — | — | EP | claimed |
| WO-2024128279-A1 | PEELING AGENT COMPOSITION FOR PHOTOIRRADIATION-BASED PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER | 日産化学株式会社 | 2024-06-20 | — | — | WO | claimed |
| CN-110808394-B | Preparation method of organic silane base proton exchange membrane | 淮阴工学院 | 2020-08-21 | — | — | CN | claimed |
| US-20200201178-A1 | PHOTOCURABLE COMPOSITION HAVING LOW SHRINKAGE AFTER CURING | CANON KABUSHIKI KAISHA (JP) | 2020-06-25 | — | — | US | claimed |
| CN-110808394-A | Preparation method of organic silane base proton exchange membrane | 淮阴工学院 | 2020-02-18 | — | — | CN | claimed |
| EP-2640780-B1 | UV CURABLE ANHYDRIDE-MODIFIED POLY(ISOBUTYLENE) | 3M INNOVATIVE PROPERTIES CO (US) | 2018-05-09 | — | — | EP | claimed |
| CN-104530417-B | A kind of multiple functionalized H types polyethyleneglycol derivative and preparation method thereof | 厦门赛诺邦格生物科技股份有限公司 | 2017-09-08 | — | — | CN | claimed |
| CN-104530415-B | A kind of different functionalization Y types polyethyleneglycol derivative, preparation method and its bio-related substance | 厦门赛诺邦格生物科技股份有限公司 | 2017-09-01 | — | — | CN | claimed |
| EP-2820052-B1 | PHOTOBASE GENERATORS AS LATENT IONIC CROSSLINKERS FOR ACRYLIC PRESSURE-SENSITIVE ADHESIVES | 3M INNOVATIVE PROPERTIES CO (US) | 2017-06-14 | — | — | EP | claimed |
| US-20160017073-A1 | PHOTOBASE GENERATORS AS LATENT IONIC CROSSLINKERS FOR ACRYLIC PRESSURE-SENSITIVE ADHESIVES | 3M INNOVATIVE PROPERTIES COMPANY | 2016-01-21 | — | — | US | claimed |
| US-20050126697-A1 | Photochemically and thermally curable adhesive formulations | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-06-16 | — | — | US | claimed |
| US-6096483-A | ULTRAVIOLET RADIATION BASE-GENERATING SUBSTANCE; SILOXANE POLYMER HAVING SILICON-HYDROGEN BONDS CAPABLE OF REACTING WITH HYDROXY GROUPS UNDER THE EFFECT OF THE BASE TO FORM SILICON-OXYGEN BONDS AND HYDROGEN; AND ACID; STORAGE STABLE | DOW CORNING ASIA, LTD. (JP) | 2000-08-01 | — | — | US | claimed |
| EP-0725106-B1 | Radiation curable compositions | DOW CORNING ASIA LTD (JP) | 1999-11-03 | — | — | EP | claimed |
| EP-0555749-B1 | Radiation sensitive compositions and processes | SHIPLEY CO (US) | 1999-05-19 | — | — | EP | claimed |
| US-5891529-A | Radiation curable sompositions | DOW CORNING ASIA, LTD. (JP) | 1999-04-06 | — | — | US | claimed |
| US-5789460-A | Radiation curable compositions | DOW CORNING ASIA, LTD. (JP) | 1998-08-04 | — | — | US | claimed |
| EP-0798341-A1 | Radiation-curable composition and method for manufacturing cured-product patterns therefrom | DOW CORNING ASIA, Ltd. (JP) | 1997-10-01 | — | — | EP | claimed |
| EP-0725106-A2 | Radiation curable compositions | DOW CORNING ASIA, Ltd. (JP) | 1996-08-07 | — | — | EP | claimed |
| EP-0555749-A1 | Radiation sensitive compositions and processes | SHIPLEY COMPANY INC. (US) | 1993-08-18 | — | — | EP | claimed |
| EP-0425142-A2 | Positive acting photoresist and method of producing same | ROHM AND HAAS COMPANY (US) | 1991-05-02 | — | — | EP | claimed |