SCHEMBL418627

SCHEMBL418627

CCOC[SiH](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL28836595 0.74
Ether SCHEMBL9175580 0.72
SCHEMBL2239332 0.72 ALDH1A1 (0.35)
SCHEMBL5186435 0.69
Ether SCHEMBL4011740 0.65 ALDH1A1 (0.41)
Ether SCHEMBL2812813 0.65
Ether SCHEMBL4973856 0.65
Ether SCHEMBL9788714 0.65
Ether SCHEMBL11882966 0.65
Ether SCHEMBL47968 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3135711-B1 COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME MERCK PATENT GMBH (DE) 2021-07-07 EP disclosed
CN-106232687-B Copolymerized polysilazane, method for producing same, composition containing same, and method for forming silica film using same AZ电子材料(卢森堡)有限公司 2020-07-07 CN disclosed
EP-2344562-B1 FLUOROPOLYMER COMPOSITIONS AND TREATED SUBSTRATES CHEMOURS CO FC LLC (US) 2019-05-22 EP disclosed
US-10246525-B2 Process for producing conjugated diene polymer ASAHI KASEI KABUSHIKI KAISHA (JP) 2019-04-02 US disclosed
US-10093831-B2 Copolymerized polysilazane, manufacturing method therefor, composition comprising same, and method for forming siliceous film using same AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2018-10-09 US disclosed
US-10072138-B2 Rubber composition for use in tire treads THE YOKOHAMA RUBBER CO., LTD (JP) 2018-09-11 US disclosed
EP-3023439-B1 METHOD FOR PRODUCING POLYMER ASAHI CHEMICAL IND (JP) 2018-02-07 EP disclosed
US-20170260301-A1 Process for Producing Conjugated Diene Polymer ASAHI KASEI KABUSHIKI KAISHA (JP) 2017-09-14 US disclosed
EP-3192634-A1 METHOD FOR PRODUCING CONJUGATED DIENE POLYMER Asahi Kasei Kabushiki Kaisha (JP) 2017-07-19 EP disclosed
EP-3135711-A1 COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2017-03-01 EP disclosed
US-20090143608-A1 SULFUR CONTAINING FLUOROALKYL AMINES AND ISOCYANATES E. I. DU PONT DE NEMOURS AND COMPNAY 2009-06-04 US disclosed
US-7229729-B2 Electrophotographic photoreceptor, process cartridge, image forming apparatus and image forming method KONICA MONOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2007-06-12 US disclosed
US-20050037274-A1 Electrophotographic photoreceptor, process cartridge, image forming apparatus and image forming method KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2005-02-17 US disclosed
US-6797444-B2 A PROTECTIVE LAYER CONTAINING A COUPLING FLUOROPOLYMER PARTICLES DISPERSED IN A COPOLYMER HAVING A FLUORINE ATOM-CONTAINING SILOXANE ADDITION-CONDENSATION PRODUCT IN A SIDE CHAIN; NONABRASIVE, HARDENING KONICA CORPORATION (JP) 2004-09-28 US disclosed
US-20030134209-A1 Electrophotographic photoreceptor and production method of the same KONICA CORPORATION (JP) 2003-07-17 US disclosed
US-6569586-B2 Comprises photosensitive layer and resin layer including organic polymer, siloxane component, and charge transfer component; durability KONICA CORPORATION (JP) 2003-05-27 US disclosed
US-20030065117-A1 Modified silicone compound, process of producing the same, and cured object obtained therefrom NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-04-03 US disclosed
US-20020076631-A1 Photoreceptor for forming electrostatic latent image KONICA CORPORATION (JP) 2002-06-20 US disclosed
US-5965663-A POLYARYLENE POLYETHER WITH CROSSLINKABLE UNSATURATED ENDGROUPS AND LOW CHLORINE AND ALKALI METAL CONTENT; FILLER; AND A COMPOUND OF MOLECULAR WEIGHT 5000 OR LESS HAVING AN UNSATURATED LINKAGE; MOLDABILTY, NON-HYGROSCOPIC KABUSHIKI KAISHA TOSHIBA (JP) 1999-10-12 US disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed