⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4192802 | 0.92 | — | — | |
| SCHEMBL8158968 | 0.91 | — | — | |
| Iodide SCHEMBL28600848 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL14954109 | 0.88 | — | — | |
| Iodide SCHEMBL14954465 | 0.88 | — | — | |
| Bromide SCHEMBL14953869 | 0.88 | — | — | |
| SCHEMBL14954218 | 0.88 | — | — | |
| Fluoride SCHEMBL14953825 | 0.88 | — | — | |
| Carbon Monoxide SCHEMBL4258007 | 0.83 | — | — | |
| SCHEMBL10607781 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1657245-B1 | ORGANOIRIDIUM COMPOUND, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING FILM | TOSOH CORP (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-1471567-B1 | Organometallic iridium compounds, processes for producing the same, and processes for producing thin films | TOSOH CORP (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-7265233-B2 | Organometallic iridium compound, process for producing the same and process for preparing film | TOSOH CORPORATION (JP) | 2007-09-04 | — | — | US | disclosed |
| US-20060204660-A1 | Organoiridium compound, process for producing the same, and process for producing film | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 2006-09-14 | — | — | US | disclosed |
| EP-1657245-A2 | ORGANOIRIDIUM COMPOUND, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING FILM | Tosoh Corporation (JP) | 2006-05-17 | — | — | EP | disclosed |
| US-6884902-B2 | Organometallic iridium compound, process of producing the same, and process of producing thin film | TOSOH CORPORATION (JP) | 2005-04-26 | — | — | US | disclosed |
| US-20040215029-A1 | Novel organometallic iridium compound, process of producing the same, and process of producing thin film | TOSOH CORPORATION | 2004-10-28 | — | — | US | disclosed |
| EP-1471567-A1 | Organometallic iridium compounds, processes for producing the same, and processes for producing thin films | Tosoh Corporation (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-6420582-B1 | ALKYLCYCLOPENTADIENYL(CYCLOPENTADIENYL)RUTHENIUM FOR MANUFACTURING A RUTHENIUM FILM OR A RUTHENIUM COMPOUND FILM BY CHEMICAL VAPOR DEPOSITION | TANAKA KIKINZOKU KOGYO K.K. (JP) | 2002-07-16 | — | — | US | disclosed |
| US-20020065427-A1 | Organometallic compounds for chemical vapor deposition and their preparing processes, and processes for chemical vapor deposition of precious-metal films and precious-metal compound films | TANAKA KIKINOZOKU KOGYO K.K. | 2002-05-30 | — | — | US | disclosed |