SCHEMBL4192802

SCHEMBL4192802

C1=CCCC=C1.[Ir]C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4186511 0.92
SCHEMBL8158968 0.89
Hydrochloric Acid SCHEMBL14954109 0.86
Fluoride SCHEMBL14953825 0.86
Bromide SCHEMBL14953869 0.86
Iodide SCHEMBL28600848 0.86
SCHEMBL14954218 0.86
Iodide SCHEMBL14954465 0.86
Carbon Monoxide SCHEMBL4258007 0.81
SCHEMBL10607781 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1471567-B1 Organometallic iridium compounds, processes for producing the same, and processes for producing thin films TOSOH CORP (JP) 2009-03-11 EP disclosed
US-6884902-B2 Organometallic iridium compound, process of producing the same, and process of producing thin film TOSOH CORPORATION (JP) 2005-04-26 US disclosed
US-20040215029-A1 Novel organometallic iridium compound, process of producing the same, and process of producing thin film TOSOH CORPORATION 2004-10-28 US disclosed
EP-1471567-A1 Organometallic iridium compounds, processes for producing the same, and processes for producing thin films Tosoh Corporation (JP) 2004-10-27 EP disclosed