⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5412419 | 0.73 | — | — | |
| SCHEMBL3693288 | 0.73 | — | — | |
| SCHEMBL525389 | 0.71 | — | — | |
| SCHEMBL3183310 | 0.71 | — | — | |
| SCHEMBL8754976 | 0.71 | — | — | |
| SCHEMBL2943630 | 0.69 | — | — | |
| SCHEMBL5413077 | 0.69 | — | — | |
| SCHEMBL65020 | 0.67 | — | — | |
| SCHEMBL7257502 | 0.67 | — | — | |
| SCHEMBL8851739 | 0.67 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115356873-B | Resin composition, light-shielding film, method for producing light-shielding film, and substrate with barrier ribs | 东丽株式会社 | 2025-04-25 | — | — | CN | disclosed |
| CN-115427514-B | Resin composition, light-shielding film, and substrate with partition wall | 东丽株式会社 | 2024-01-02 | — | — | CN | disclosed |
| CN-109716491-B | Method for manufacturing field effect transistor and method for manufacturing wireless communication device | 东丽株式会社 | 2023-06-09 | — | — | CN | disclosed |
| CN-111771163-B | Negative photosensitive coloring composition, cured film, and touch panel using same | 东丽株式会社 | 2023-06-02 | — | — | CN | disclosed |
| CN-111295755-B | Integrated circuit, method of manufacturing the same, and wireless communication device using the same | 东丽株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-108292630-B | Ferroelectric memory element, method for manufacturing the same, memory cell using the same, and wireless communication device using the same | 东丽株式会社 | 2023-04-25 | — | — | CN | disclosed |
| US-20120282458-A1 | WATER-REPELLENT SUBSTRATE AND PROCESS FOR ITS PRODUCTION | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120021177-A1 | WATER-REPELLENT SUBSTRATE AND PROCESS FOR ITS PRODUCTION | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20090304996-A1 | ARTICLE HAVING WATER-REPELLENT SURFACE | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-12-10 | — | — | US | disclosed |
| EP-2116518-A1 | ARTICLES HAVING WATER-REPELLENT SURFACES | Asahi Glass Company, Limited (JP) | 2009-11-11 | — | — | EP | disclosed |
| US-6420269-B2 | USEFUL IN PRODUCING SEMICONDUCTOR CHIPS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-07-16 | — | — | US | disclosed |
| EP-0820092-A1 | CERIUM OXIDE ABRASIVE, SEMICONDUCTOR CHIP, SEMICONDUCTOR DEVICE, PROCESS FOR THE PRODUCTION OF THEM, AND METHOD FOR THE POLISHING OF SUBSTRATES | HITACHI CHEMICAL CO., LTD. (JP) | 1998-01-21 | — | — | EP | disclosed |
| EP-0768352-A1 | MATERIAL FOR FORMING SILICA-BASE COATED INSULATION FILM, PROCESS FOR PRODUCING THE MATERIAL, SILICA-BASE INSULATION FILM, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING THE DEVICE | HITACHI CHEMICAL CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |