Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | FNTA | P49354 | 1/20 | 0.31 |
| ▸ | FNTB | P49356 | 1/20 | 0.31 |
| ▸ | PGGT1B | P53609 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4196051 | 1.00 | LMNA (0.33) | LMNAALDH1A1HSD17B10THRBFNTA | |
| SCHEMBL4199086 | 0.87 | LMNA (0.39) | LMNAALDH1A1HSD17B10THRB | |
| SCHEMBL4199090 | 0.87 | LMNA (0.39) | LMNAALDH1A1HSD17B10THRB | |
| SCHEMBL10622241 | 0.81 | LMNA (0.40) | LMNAALDH1A1HSD17B10THRBFNTA | |
| SCHEMBL10969264 | 0.81 | LMNA (0.35) | LMNAALDH1A1HSD17B10THRBFNTA | |
| SCHEMBL4275084 | 0.73 | LMNA (0.39) | LMNAALDH1A1HSD17B10THRB | |
| SCHEMBL8665797 | 0.72 | LMNA (0.43) | LMNAALDH1A1HSD17B10THRB | |
| SCHEMBL3141884 | 0.72 | — | — | |
| SCHEMBL15137737 | 0.72 | — | — | |
| SCHEMBL12955873 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8481247-B2 | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL INDUSTRIES, LTD. | 2013-07-09 | — | — | US | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |