⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8190148 | 1.00 | — | — | |
| SCHEMBL18662355 | 0.85 | EPHX1 (0.60) | — | |
| SCHEMBL18475421 | 0.85 | EPHX1 (0.60) | — | |
| SCHEMBL6268437 | 0.85 | EPHX1 (0.60) | — | |
| SCHEMBL18812605 | 0.85 | EPHX1 (0.60) | — | |
| SCHEMBL24158327 | 0.84 | EPHX1 (1.00) | — | |
| SCHEMBL14085997 | 0.84 | — | — | |
| SCHEMBL22907227 | 0.84 | — | — | |
| SCHEMBL22452920 | 0.84 | EPHX1 (1.00) | — | |
| SCHEMBL14087180 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170101398-A1 | PYRAZOLYL SUBSTITUTED TETRAHYDROPYRANYLSULFONES | Grünenthal GmbH (DE) | 2017-04-13 | — | — | US | disclosed |
| WO-2017059965-A1 | PYRAZOLYL SUBSTITUTED TETRAHYDROPYRANYLSULFONES | Grünenthal GmbH (DE) | 2017-04-13 | — | — | WO | disclosed |
| WO-2017059966-A1 | PYRAZOLYL SUBSTITUTED TETRAHYDROPYRANYLSULFONES | Grünenthal GmbH (DE) | 2017-04-13 | — | — | WO | disclosed |
| US-9543147-B2 | Photoresist and method of manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-01-10 | — | — | US | disclosed |
| US-9502231-B2 | Photoresist layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-11-22 | — | — | US | disclosed |
| US-9460909-B2 | Method for manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-10-04 | — | — | US | disclosed |
| US-9436086-B2 | Anti-reflective layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-09-06 | — | — | US | disclosed |
| US-20160155632-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MFG (TW) | 2016-06-02 | — | — | US | disclosed |
| US-20160155626-A1 | Method for Manufacturing Semiconductor Device | TAIWAN SEMICONDUCTOR MFG (TW) | 2016-06-02 | — | — | US | disclosed |
| US-9256128-B2 | Method for manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-02-09 | — | — | US | disclosed |
| US-9245751-B2 | Anti-reflective layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-01-26 | — | — | US | disclosed |
| US-20160013041-A1 | Photoresist Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-01-14 | — | — | US | disclosed |
| US-20160005595-A1 | Photoresist and Method of Manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-01-07 | — | — | US | disclosed |
| US-20150111384-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2015-04-23 | — | — | US | disclosed |
| US-20140273457-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-8481247-B2 | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL INDUSTRIES, LTD. | 2013-07-09 | — | — | US | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-4203898-A | ANTICARCINOGENIC | ELI LILLY AND COMPANY (US) | 1980-05-20 | — | — | US | disclosed |