SCHEMBL4201008

SCHEMBL4201008

CO[Si](C)(C)C.C[Si](C)(Cl)CCl

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL124324 0.82
SCHEMBL28082973 0.80
SCHEMBL27601279 0.78 ALDH1A1 (0.55) ALDH1A1
SCHEMBL27906289 0.78
SCHEMBL28853736 0.75
Methyl Alcohol SCHEMBL27961453 0.74
SCHEMBL2456899 0.73
SCHEMBL28152 0.73
SCHEMBL28850972 0.71
SCHEMBL28138929 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11372330-B2 Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-06-28 US disclosed
CN-103838086-B The composition of the formation antireflection film of reaction product containing isocyanuric acid compound and benzoic acid compounds 日产化学工业株式会社 2017-10-20 CN disclosed
CN-104159938-B Polymer, compositions containing this polymer and single coating type horizontal alignment film 日产化学工业株式会社 2016-08-17 CN disclosed
CN-103838086-A Composition containing reaction product of isocyanuric acid compound and benzoic acid compound for forming anti-reflection film NISSAN CHEMICAL IND LTD 2014-06-04 CN disclosed
US-20090117493-A1 Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-05-07 US disclosed
CN-101268419-A Composition for forming antireflection film containing reaction product of isocyanuric acid compound and benzoic acid compound NISSAN CHEMICAL INDUSTRY LTD (JP) 2008-09-17 CN disclosed
EP-1939688-A1 COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND Nissan Chemical Industries, Ltd. (JP) 2008-07-02 EP disclosed