Benzylamine

Benzylamine

SCHEMBL4227822

NCc1ccccc1.OCc1ccccc1

nearest known ligand 0.74

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 4/20 0.74
TSHR P16473 2/20 0.74
TAAR1 Q96RJ0 2/20 0.54
CYP1A2 P05177 1/20 0.52
CYP2D6 P10635 1/20 0.52
CYP2C9 P11712 1/20 0.52
CYP2C19 P33261 1/20 0.52
ENPP2 Q13822 2/20 0.50
LTA4H P09960 1/20 0.48
MAOB P27338 1/20 0.47
CYP2A6 P11509 1/20 0.46
HTR2A P28223 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
ABAT P80404 1/20 0.46
PNMT P11086 1/20 0.44
KIF11 P52732 1/20 0.44
HRH3 Q9Y5N1 1/20 0.43
PRSS1 P07477 1/20 0.43
PRSS2 P07478 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzylamine SCHEMBL27781209 0.89 LOXL2 (0.93) LOXL2TSHRTAAR1CYP1A2CYP2D6
Benzylamine SCHEMBL28471738 0.86 LOXL2 (0.78) LOXL2TSHRTAAR1CYP1A2CYP2D6
SCHEMBL216928 0.86 ABAT (0.60) LOXL2TSHRTAAR1ABATHRH3
Benzylamine SCHEMBL1331207 0.86
SCHEMBL19242392 0.86 LOXL2 (1.00) LOXL2TSHRTAAR1CYP1A2CYP2D6
Benzylamine SCHEMBL373 0.86
Benzyl Alcohol SCHEMBL433990 0.86 TSHR (1.00) LOXL2TSHRENPP2LTA4HMAOB
Benzyl Alcohol SCHEMBL11353823 0.86 TSHR (1.00) LOXL2TSHRENPP2LTA4HMAOB
Benzyl Alcohol SCHEMBL9066990 0.86 TSHR (1.00) LOXL2TSHRENPP2LTA4HMAOB
Benzyl Alcohol SCHEMBL147 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7585610-B2 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same FUJITSU LIMITED (JP) 2009-09-08 US disclosed
US-20060188807-A1 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same FUJITSU LIMITED (JP) 2006-08-24 US disclosed