Sulfuric Acid

Sulfuric Acid

SCHEMBL4230482

O.O.O.O.O=S(=O)([O-])[O-].[Pt+2]

nearest known ligand 0.42

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Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.42
ALDH1A1 P00352 1/20 0.42
TSHR P16473 1/20 0.42
KMT2A Q03164 1/20 0.42
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL15710177 1.00
Sulfuric Acid SCHEMBL28811363 1.00
Sulfuric Acid SCHEMBL15767666 0.94 MEN1 (0.39) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL15710669 0.94 MEN1 (0.39) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL318414 0.94
Sulfuric Acid SCHEMBL23827344 0.88 MEN1 (0.42) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL23294054 0.88 MEN1 (0.42) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL21294080 0.88 ALDH1A1 (0.55) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL25265024 0.88 MEN1 (0.42) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL20555813 0.88 MEN1 (0.42) MEN1ALDH1A1TSHRKMT2ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117843466-A Synthesis method of hexafluoroacetylacetone platinum (II) 江苏欣诺科催化剂股份有限公司 2024-04-09 CN disclosed
EP-1544164-B1 Hermetic wafer-level packaging for MEMS devices with low-temperature metallurgy TELEDYNE DALSA SEMICONDUCTOR INC (CA) 2015-04-01 EP disclosed
EP-1853519-B1 ZERO VALENT METAL COMPOSITE, MANUFACTURING, SYSTEM AND METHOD USING THEREOF, FOR CATALYTICALLY TREATING CONTAMINATED WATER YEDA RES & DEV (IL) 2014-09-03 EP disclosed
US-8598062-B2 Zero valent metal composite, manufacturing, system and method using thereof, for catalytically treating contaminated water YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) 2013-12-03 US disclosed
US-20130123098-A1 ZERO VALENT METAL COMPOSITE, MANUFACTURING, SYSTEM AND METHOD USING THEREOF, FOR CATALYTICALLY TREATING CONTAMINATED WATER YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) 2013-05-16 US disclosed
US-8366940-B2 Zero valent metal composite, manufacturing, system and method using thereof, for catalytically treating contaminated water YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) 2013-02-05 US disclosed
US-20090127208-A1 ZERO VALENT METAL COMPOSITE, MANUFACTURING, SYSTEM AND METHOD USING THEREOF, FOR CATALYTICALLY TREATING CONTAMINATED WATER YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) 2009-05-21 US disclosed
EP-1853519-A2 ZERO VALENT METAL COMPOSITE, MANUFACTURING, SYSTEM AND METHOD USING THEREOF, FOR CATALYTICALLY TREATING CONTAMINATED WATER YEDA RESEARCH AND DEVELOPMENT CO., LTD. (IL) 2007-11-14 EP disclosed
US-7291513-B2 Hermetic wafer-level packaging for MEMS devices with low-temperature metallurgy DALSA SEMICONDUCTOR INC. (CA) 2007-11-06 US disclosed
WO-2006072944-A2 ZERO VALENT METAL COMPOSITE FOR CATALYTICALY TREATING CONTAMINATED WATER YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) 2006-07-13 WO disclosed
US-20050142685-A1 Hermetic wafer-level packaging for MEMS devices with low-temperature metallurgy DALSA SEMICONDUCTOR INC. (CA) 2005-06-30 US disclosed
EP-1544164-A2 Hermetic wafer-level packaging for MEMS devices with low-temperature metallurgy Dalsa Semiconductor Inc. (CA) 2005-06-22 EP disclosed