SCHEMBL4238474

SCHEMBL4238474

CC(C)(C)NC(C)(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23224 0.82
SCHEMBL839562 0.78 ALDH1A1 (0.31)
Fluoride SCHEMBL6858466 0.78 ALDH1A1 (0.31)
Hydrochloric Acid SCHEMBL3362611 0.78 ALDH1A1 (0.31)
SCHEMBL17334519 0.75
SCHEMBL49720 0.71
SCHEMBL8771438 0.69
Water SCHEMBL23525631 0.67
Hydrochloric Acid SCHEMBL6065121 0.67
SCHEMBL5925136 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117737733-A Copper etching solution for strengthening molybdenum-niobium alloy etching and etching method 江阴江化微电子材料股份有限公司 2024-03-22 CN claimed
CN-116731798-A Fluorine-free cleaning agent, and preparation method and application thereof 嘉庚创新实验室 2023-09-12 CN claimed
CN-113026018-B Etching solution composition of copper-molybdenum alloy and etching method 四川江化微电子材料有限公司 2022-11-22 CN claimed
CN-113717038-B Method for synthesizing diaryl ether by nickel/ketone double-catalysis reaction of halogenated aromatic hydrocarbon and aryl phenol 苏州大学 2022-08-16 CN claimed
CN-114560832-A Method for synthesizing dibenzofuran compound 盐城师范学院 2022-05-31 CN claimed
CN-113026018-A Etching solution composition of copper-molybdenum alloy and etching method 四川江化微电子材料有限公司 2021-06-25 CN claimed
EP-2692807-B1 AQUEOUS COATING COMPOSITION DAINIPPON TORYO KK (JP) 2019-05-08 EP claimed
CN-114380675-B Method for synthesizing aryl phenol by reacting halogenated aromatic hydrocarbon and phenol compound under induction of visible light 苏州大学 2024-06-11 CN disclosed
CN-117737733-A Copper etching solution for strengthening molybdenum-niobium alloy etching and etching method 江阴江化微电子材料股份有限公司 2024-03-22 CN disclosed
CN-116731798-A Fluorine-free cleaning agent, and preparation method and application thereof 嘉庚创新实验室 2023-09-12 CN disclosed
CN-114317127-B Fluorine-free cleaning agent, and preparation method and application thereof 嘉庚创新实验室 2023-07-04 CN disclosed
CN-113026018-B Etching solution composition of copper-molybdenum alloy and etching method 四川江化微电子材料有限公司 2022-11-22 CN disclosed
CN-113717038-B Method for synthesizing diaryl ether by nickel/ketone double-catalysis reaction of halogenated aromatic hydrocarbon and aryl phenol 苏州大学 2022-08-16 CN disclosed
US-8940823-B2 Water-based coating composition DAI NIPPON TORYO CO., LTD. (JP) 2015-01-27 US disclosed
EP-2692807-A1 AQUEOUS COATING COMPOSITION Dai Nippon Toryo Co., Ltd. (JP) 2014-02-05 EP disclosed
US-20120177938-A1 METALWORKING FLUID, METAL WORKING METHOD AND METAL WORK PRODUCT KYODO YUSHI CO., LTD. (JP) 2012-07-12 US disclosed
US-7790748-B2 N-alkyl-4-methyleneamino-3-hydroxy-2-pyridones WARNER CHILCOTT COMPANY, LLC (US) 2010-09-07 US disclosed
US-20090118151-A1 Metal-Processing Oil Composition and Metal-Processing Method KYODO YUSHI CO., LTD. (JP) 2009-05-07 US disclosed
EP-1892282-A1 METALWORKING FLUID COMPOSITION AND METALWORKING PROCESS KYODO YUSHI CO., LTD. (JP) 2008-02-27 EP disclosed
US-20070270407-A1 N-alkyl-4-methyleneamino-3-hydroxy-2-pyridones THE PROCTER & GAMBLE COMPANY 2007-11-22 US disclosed