SCHEMBL4239989

SCHEMBL4239989

CC=C(C)C(=O)OCC(CC)CCCC

nearest known ligand 0.59

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.59
CYP3A4 P08684 5/20 0.58
TDP1 Q9NUW8 2/20 0.58
ATM Q13315 1/20 0.58
ALDH1A1 P00352 6/20 0.51
CA2 P00918 4/20 0.51
RECQL P46063 1/20 0.49
LMNA P02545 3/20 0.47
MAPK1 P28482 3/20 0.47
L3MBTL1 Q9Y468 1/20 0.46
HSD17B10 Q99714 1/20 0.46
PRSS1 P07477 1/20 0.46
PRSS2 P07478 1/20 0.46
PRSS3 P35030 1/20 0.46
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP14 P50281 1/20 0.40
FAAH O00519 1/20 0.40
CA1 P00915 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28825130 0.89 TSHR (0.58) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL1596232 0.89 TSHR (0.46) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL29109726 0.88 TSHR (0.54) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL11895465 0.87 TSHR (0.45) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL28283091 0.87 TSHR (0.56) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL10705649 0.86 CYP3A4 (0.49) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL27969837 0.86 TSHR (0.52) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL363064 0.86 TSHR (0.63) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL29558890 0.86 TSHR (0.55) TSHRCYP3A4TDP1ATMALDH1A1
SCHEMBL31362015 0.86 TSHR (0.63) TSHRCYP3A4TDP1ATMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10693148-B2 Cathode, metal-air battery including the cathode, and method of preparing the cathode SAMSUNG ELECTRONICS CO., LTD. (KR) 2020-06-23 US disclosed
US-10025011-B2 Composition, infrared transmission filter and method for manufacturing the same, and infrared sensor FUJIFILM CORPORATION (JP) 2018-07-17 US disclosed
CN-104352284-B A kind of dental prosthetic method 儒伽医疗有限公司 2018-06-05 CN disclosed
CN-103718106-B Coloring composition, coloring radiation-sensitive composition, color filter, and solid-state imaging device 富士胶片株式会社 2017-10-17 CN disclosed
US-20160372807-A1 CATHODE, METAL-AIR BATTERY INCLUDING THE CATHODE, AND METHOD OF PREPARING THE CATHODE SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-12-22 US disclosed
US-20150260885-A1 COMPOSITION, INFRARED TRANSMISSION FILTER AND METHOD FOR MANUFACTURING THE SAME, AND INFRARED SENSOR FUJIFILM CORPORATION (JP) 2015-09-17 US disclosed
US-9096704-B2 Impact modifier, method for preparing the same and scratch resistant methacrylate resin composition using the same CHEIL INDUSTRIES INC. (KR) 2015-08-04 US disclosed
CN-104352284-A Dental restoring method WANG XI 2015-02-18 CN disclosed
CN-103718106-A Coloring composition, coloring radiation-sensitive composition, color filter, and solid-state imaging device FUJI PHOTO FILM CO LTD 2014-04-09 CN disclosed
EP-2104693-B1 IMPACT MODIFIER, METHOD FOR PREPARING THE SAME AND SCRATCH RESISTANT METHACRYLATE RESIN COMPOSITION USING THE SAME CHEIL IND INC (KR) 2012-08-08 EP disclosed
EP-2104693-A1 IMPACT MODIFIER, METHOD FOR PREPARING THE SAME AND SCRATCH RESISTANT METHACRYLATE RESIN COMPOSITION USING THE SAME Cheil Industries Inc. (KR) 2009-09-30 EP disclosed
US-20090240002-A1 Impact Modifier, Method for Preparing the Same and Scratch Resistant Methacrylate Resin Composition Using the Same CHEIL INDUSTRIES INC. (KR) 2009-09-24 US disclosed
WO-2008082173-A1 IMPACT MODIFIER, METHOD FOR PREPARING THE SAME AND SCRATCH RESISTANT METHACRYLATE RESIN COMPOSITION USING THE SAME CHEIL INDUSTRIES INC. (KR) 2008-07-10 WO disclosed
US-4355886-A Polyvinyl acetal coated carrier particles for magnetic brush cleaning XEROX CORPORATION (US) 1982-10-26 US disclosed