SCHEMBL424211

SCHEMBL424211

CC=C(C)C(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.34
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28116438 1.00 THRB (0.34) THRBLMNA
SCHEMBL28116060 1.00 THRB (0.34) THRBLMNA
SCHEMBL4603434 0.87
SCHEMBL28953923 0.84 THRB (0.31) THRB
SCHEMBL28953925 0.84 THRB (0.31) THRB
SCHEMBL28116061 0.84
SCHEMBL9718672 0.82 THRB (0.31) THRB
SCHEMBL9718602 0.82 THRB (0.31) THRB
SCHEMBL9674360 0.82 THRB (0.31) THRB
SCHEMBL9718553 0.82 THRB (0.31) THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9139740-B2 Flow modifier for water-based coating material and water-based coating composition containing same KANSAI PAINT CO., LTD. (JP) 2015-09-22 US disclosed
US-8771796-B2 Coating film formation method KANSAI PAINT CO., LTD. (JP) 2014-07-08 US disclosed
US-20130157071-A1 COATING FILM FORMATION METHOD KANSAI PAINT CO., LTD. (JP) 2013-06-20 US disclosed
US-20120022205-A1 FLOW MODIFIER FOR WATER-BASED COATING MATERIAL AND WATER-BASED COATING COMPOSITION CONTAINING SAME KANSAI PAINT CO., LTD. (JP) 2012-01-26 US disclosed
US-8017211-B2 Composition, cured product and article MITSUBISHI CHEMICAL CORPORATION (JP) 2011-09-13 US disclosed
US-20100129587-A1 COMPOSITION, CURED PRODUCT AND ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2010-05-27 US disclosed