SCHEMBL42436

SCHEMBL42436

CC[SiH](CC)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8894521 0.79
SCHEMBL2273483 0.79
SCHEMBL2266539 0.75
SCHEMBL2272026 0.73
SCHEMBL2267875 0.73 TP53 (0.35)
SCHEMBL1326087 0.69 TSHR (0.38)
SCHEMBL1325844 0.69 TSHR (0.38)
SCHEMBL9383222 0.67 TSHR (0.33)
SCHEMBL10523985 0.65 TSHR (0.35)
SCHEMBL1325981 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 858 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2823083-A1 METHODS FOR MAKING SILICON CONTAINING FILMS ON THIN FILM TRANSISTOR DEVICES Air Products and Chemicals, Inc. (US) 2015-01-14 EP claimed
WO-2013134653-A1 METHODS FOR MAKING SILICON CONTAINING FILMS ON THIN FILM TRANSISTOR DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-09-12 WO claimed
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP claimed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP claimed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US claimed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US claimed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO claimed
CN-118290622-A Metallocene compound, catalyst component for olefin polymerization and catalyst for olefin polymerization comprising the same, and method for producing olefin polymer using catalyst for olefin polymerization 日本聚乙烯株式会社 2024-07-05 CN disclosed
EP-3984994-B1 SUBSTITUTED PIPERIDINE COMPOUND AS OREXIN TYPE 2 AGONIST FOR THE TREATMENT OF NARCOLEPSY TAKEDA PHARMACEUTICALS CO (JP) 2024-07-03 EP disclosed
CN-111936505-B Tertiary alkyl-substituted polycyclic aromatic compounds and uses thereof 学校法人关西学院 2024-07-02 CN disclosed
CN-118239964-A Polycyclic aromatic compound, polymer compound, material for organic device, organic electroluminescent element, display device, and lighting device 国立大学法人京都大学 2024-06-25 CN disclosed
CN-118239965-A Polycyclic aromatic compound, polymer thereof, material for organic device, use of the same, organic electroluminescent element, and use of the same 国立大学法人京都大学 2024-06-25 CN disclosed
CN-118221706-A Polycyclic aromatic compound, organic electroluminescent element, display device, and lighting device 国立大学法人京都大学 2024-06-21 CN disclosed
EP-0347158-A2 3-deoxy mycaminosyl tylonolide derivatives ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) 1989-12-20 EP disclosed
US-4772694-A Chiral 3-(1,2,5-trisubstituted imidazolidinone) azetidinone antibiotic intermediates ELI LILLY AND COMPANY (US) 1988-09-20 US disclosed
US-4734498-A 3β-succinimidoazetidinones as chiral intermediates ELI LILLY AND COMPANY (US) 1988-03-29 US disclosed
EP-0254578-A1 Antibiotic intermediates ELI LILLY AND COMPANY (US) 1988-01-27 EP disclosed
EP-0252744-A2 3-Beta-(3,4-disubstituted succinimido)azetidinones ELI LILLY AND COMPANY (US) 1988-01-13 EP disclosed
EP-0244195-A1 2-Vinylpenams and process THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF OXFORD (GB) 1987-11-04 EP disclosed
US-4291166-A ANTICOAGULANTS RESEARCH CORPORATION (US) 1981-09-22 US disclosed