SCHEMBL4243901

SCHEMBL4243901

O=C(O)C=COC(C=CC(=O)O)(C=CC(=O)O)C(CO)(CO)C(O)(C=CC(=O)O)C=CC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL157683 0.95 ALDH1A1 (0.31)
Phosphoric Acid SCHEMBL2703749 0.90
SCHEMBL1011667 0.90 HCAR2 (0.31)
SCHEMBL9244672 0.86 ALDH1A1 (0.30)
SCHEMBL3356698 0.85 ALDH1A1 (0.34)
SCHEMBL157690 0.85 ALDH1A1 (0.34)
SCHEMBL15066460 0.83 ALDH1A1 (0.33)
SCHEMBL1721573 0.81 ALDH1A1 (0.32)
SCHEMBL9863317 0.80 ALDH1A1 (0.31)
SCHEMBL9576231 0.77 TSHR (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2009124672-A1 CONDITIONING AGENT FOR THE CORROSION OF ENAMEL LESIONS ERNST MÜHLBAUER GMBH & CO. KG (DE) 2009-10-15 WO claimed
EP-0281808-A2 Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring SIEMENS AKTIENGESELLSCHAFT (DE) 1988-09-14 EP claimed
EP-0054942-B1 ADHESIVES FOR BONDING OPTICAL ELEMENTS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1986-03-05 EP claimed
EP-4312947-A1 SELF-ADHESIVE FISSURE SEALANT Kulzer GmbH (DE) 2024-02-07 EP disclosed
WO-2023227525-A1 PHOTOINITIATORS FOR PHOTOCURABLE COMPOSITIONS COVESTRO (NETHERLANDS) B.V. (NL) 2023-11-30 WO disclosed
CN-113087915-B UV-photocatalytic-chitosan-based vegetable oil polyol and preparation method and application thereof 中国热带农业科学院南亚热带作物研究所 2021-11-30 CN disclosed
CN-113087915-A UV-photocatalytic-chitosan-based vegetable oil polyol and preparation method and application thereof 中国热带农业科学院南亚热带作物研究所 2021-07-09 CN disclosed
US-20150184004-A1 LITHOGRAPHIC OFFSET INKS WITH WATER AND FILLER CONTENT SUN CHEMICAL CORPORATION (US) 2015-07-02 US disclosed
WO-2013173457-A1 ANIONIC ELECTRODEPOSITABLE COATING COMPOSITIONS CAPABLE OF FORMING LOW GLOSS COATINGS PPG INDUSTRIES OHIO, INC. (US) 2013-11-21 WO disclosed
US-20120292626-A1 OPTICAL AND THERMAL ENERGY CROSS-LINKABLE INSULATING LAYER MATERIAL FOR ORGANIC THIN FILM TRANSISTOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-11-22 US disclosed
WO-2009124671-A1 CONDITIONING AGENT FOR THE CORROSION OF ENAMEL LESIONS ERNST MÜHLBAUER GMBH & CO. KG (DE) 2009-10-15 WO disclosed
EP-0933399-B1 Aminosilicone oil emulsions crosslinked by Michael addition-type reactions WACKER CHEMIE GMBH (DE) 2000-09-13 EP disclosed
EP-0756200-B1 Silver halide color photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 1999-11-10 EP disclosed
US-5981154-A USED FOR COLOR PROOF WHICH IS CAPABLE OF GIVING A COLOR PROOF HAVING IMPROVED CLOSENESS TO PRINT IMAGE QUALITY AND A STABLE TONE IMAGE KONICA CORPORATION (JP) 1999-11-09 US disclosed
EP-0933399-A1 Aminosilicone oil emulsions crosslinked by Michael addition-type reactions Wacker-Chemie GmbH (DE) 1999-08-04 EP disclosed
US-5780215-A PAPER SUPPORT COATED ON SILVER EMULSION SIDE WITH TWO RESINS CONTAINING WHITE PIGMENT OF DIFFERING CONCENTRATIONS; CYAN COUPLERS; AGING RESISTANCE; GLOSS, DISCOLORATION INHIBITION OF THE WHITE BACKGROUND; COLORFASTNESS KONICA CORPORATION (JP) 1998-07-14 US disclosed
EP-0723192-B1 Silver halide color photographic light-sensitive material and method of preparing color proof therefrom KONISHIROKU PHOTO IND (JP) 1998-05-27 EP disclosed
EP-0756200-A1 Silver halide color photographic light-sensitive material KONICA CORPORATION (JP) 1997-01-29 EP disclosed
EP-0723192-A1 Silver halide color photographic light-sensitive material and method of preparing color proof therefrom KONICA CORPORATION (JP) 1996-07-24 EP disclosed
EP-0425440-A1 Method of adjusting the photosensitivity of photopolymerizable compositions CIBA-GEIGY AG (CH) 1991-05-02 EP disclosed