SCHEMBL4247823

SCHEMBL4247823

CCO[SiH2]C[SiH2]OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4250358 0.77
SCHEMBL58991 0.77
SCHEMBL5694299 0.72
SCHEMBL231812 0.72
SCHEMBL5198119 0.72
SCHEMBL10527152 0.72
SCHEMBL1937424 0.72
SCHEMBL4808929 0.72
SCHEMBL22471926 0.69
SCHEMBL18108169 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119081643-A Low-viscosity high-heat-conductivity organic silicon bonding pouring sealant and preparation method thereof 硅宝正基(深圳)科技有限公司 2024-12-06 CN claimed
CN-119081643-A Low-viscosity high-heat-conductivity organic silicon bonding pouring sealant and preparation method thereof 硅宝正基(深圳)科技有限公司 2024-12-06 CN disclosed
CN-108862304-B Hydrophobic hybrid silicon-aluminum molecular sieve containing organic groups and having micro-nano hierarchical structure and preparation method thereof 武汉理工大学 2022-02-18 CN disclosed
EP-1970421-B1 COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID JGC CATALYSTS & CHEMICALS LTD (JP) 2015-04-29 EP disclosed
US-20130280654-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE CURED FILM SUMITOMO BAKELITE CO (JP) 2013-10-24 US disclosed
US-8492469-B2 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device including the cured film SUMITOMO BAKELITE CO., LTD. (JP) 2013-07-23 US disclosed
US-20110136952-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE CURED FILM SUMITOMO BAKELITE CO., LTD. (JP) 2011-06-09 US disclosed
US-20090025609-A1 Coating Liquid for Forming Low Dielectric Constant Amorphous Silica-Based Coating Film and the Coating Film Obtained From the Same JGC CATALYSTS AND CHEMICALS LTD. (JP) 2009-01-29 US disclosed
EP-1970421-A1 COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) 2008-09-17 EP disclosed
US-4788311-A Novel organosilicon compounds useful as a stabilizer for organopolysiloxane compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-11-29 US disclosed