⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27939261 | 0.83 | — | — | |
| SCHEMBL27951731 | 0.83 | — | — | |
| SCHEMBL4247823 | 0.77 | — | — | |
| SCHEMBL4250358 | 0.77 | — | — | |
| SCHEMBL1937424 | 0.72 | — | — | |
| SCHEMBL231812 | 0.72 | — | — | |
| SCHEMBL413731 | 0.72 | — | — | |
| SCHEMBL4808929 | 0.72 | — | — | |
| SCHEMBL5694299 | 0.72 | — | — | |
| SCHEMBL10527152 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 234 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117535003-B | Matte paint for aluminum-plastic film of soft-package battery and coating method | 浙江锂盾新能源材料有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-116410470-A | Polyhydroxy cyclic polymer modified organic silicon resin, preparation method thereof and organic silicon pouring sealant | 湖南广信科技发展有限公司 | 2023-07-11 | — | — | CN | claimed |
| CN-112834088-B | Bionic MXene aerogel-based sensing material and preparation method and application thereof | 南开大学 | 2022-06-28 | — | — | CN | claimed |
| US-20210002471-A1 | A POLYAMIDE COMPOSITION, MANUFACTURING METHOD, AN APPLICATION AND ARTICLE THEREOF | BASF SE (DE) | 2021-01-07 | — | — | US | claimed |
| CN-104593747-B | Dielectric Barrier Deposition Using Oxygen-Containing Precursors | 弗萨姆材料美国有限责任公司 | 2019-05-28 | — | — | CN | claimed |
| CN-103022245-B | For photovoltaic passivation containing oxygen precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-03-02 | — | — | CN | claimed |
| CN-104593747-A | Dielectric Barrier Deposition Using Oxygen Containing Precursor | AIR PROD & CHEM | 2015-05-06 | — | — | CN | claimed |
| CN-102232125-B | Dielectric barrier deposition using oxygen-containing precursors | AIR PROD & CHEM | 2015-01-28 | — | — | CN | claimed |
| US-8637396-B2 | Dielectric barrier deposition using oxygen containing precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-01-28 | — | — | US | claimed |
| US-20130247971-A1 | Oxygen Containing Precursors for Photovoltaic Passivation | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-09-26 | — | — | US | claimed |
| CN-103022245-A | Oxygen containing precursors for photovoltaic passivation | AIR PROD & CHEM | 2013-04-03 | — | — | CN | claimed |
| US-8130314-B2 | Solid-state image capturing apparatus, mounting method of solid-state image capturing apparatus, manufacturing method of solid-state image capturing apparatus, and electronic information device | SHARP KABUSHIKI KAISHA (JP) | 2012-03-06 | — | — | US | claimed |
| CN-102232125-A | Dielectric barrier deposition using oxygen-containing precursors | AIR PROD & CHEM | 2011-11-02 | — | — | CN | claimed |
| EP-2376672-A1 | DIELECTRIC BARRIER DEPOSITION USING OXYGEN CONTAINING PRECURSOR | Air Products and Chemicals, Inc. (US) | 2011-10-19 | — | — | EP | claimed |
| WO-2010065410-A1 | DIELECTRIC BARRIER DEPOSITION USING OXYGEN CONTAINING PRECURSOR | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-10 | — | — | WO | claimed |
| US-20100136789-A1 | Dielectric Barrier Deposition Using Oxygen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-03 | — | — | US | claimed |
| US-20090190009-A1 | Solid-state image capturing apparatus, mounting method of solid-state image capturing apparatus, manufacturing method of solid-state image capturing apparatus, and electronic information device | SHARP KABUSHIKI KAISHA (JP) | 2009-07-30 | — | — | US | claimed |
| EP-0917501-A1 | METHOD FOR ISOLATING ULTRAFINE AND FINE PARTICLES AND RESULTING PARTICLES | Tecle, Berhan (US) | 1999-05-26 | — | — | EP | claimed |
| WO-1997033713-A1 | METHOD FOR ISOLATING ULTRAFINE AND FINE PARTICLES AND RESULTING PARTICLES | TECLE BERHAN (US) | 1997-09-18 | — | — | WO | claimed |
| JP-11315224-A | — | — | None | — | — | JP | disclosed |
| EP-4602106-A1 | EMISSION FREE SILICONE RUBBER COMPOUNDS | Nitrochemie Aschau GmbH (DE) | 2025-08-20 | — | — | EP | disclosed |
| CN-119731283-A | Adhesive sheet, adhesive composition, and structure | 大日本印刷株式会社 | 2025-03-28 | — | — | CN | disclosed |
| CN-113396059-B | Novel system for priming and bonding floor coverings | 科思创德国股份有限公司 | 2024-10-22 | — | — | CN | disclosed |
| EP-4441149-A1 | COMPOSITION FOR SILICONE RUBBER MATERIALS | Nitrochemie Aschau GmbH (DE) | 2024-10-09 | — | — | EP | disclosed |
| CN-118355078-A | Composition for silicone rubber material | 硝基化学阿绍有限公司 | 2024-07-16 | — | — | CN | disclosed |
| CN-117535003-B | Matte paint for aluminum-plastic film of soft-package battery and coating method | 浙江锂盾新能源材料有限公司 | 2024-07-05 | — | — | CN | disclosed |
| EP-3615593-B1 | SILANE MODIFIED POLYMERS WITH IMPROVED PROPERTIES | HENKEL AG & CO KGAA (DE) | 2024-05-15 | — | — | EP | disclosed |
| WO-2024079186-A1 | EMISSION FREE SILICONE RUBBER COMPOUNDS | NITROCHEMIE ASCHAU GMBH (DE) | 2024-04-18 | — | — | WO | disclosed |
| EP-3714015-B1 | NEW SYSTEMS FOR PRIMING AND BONDING OF FLOORING MATERIALS | COVESTRO DEUTSCHLAND AG (DE) | 2024-04-17 | — | — | EP | disclosed |
| CN-117535003-A | Matte paint for aluminum-plastic film of soft-package battery and coating method | 浙江锂盾新能源材料有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-117531679-A | Double-sided modification method for barrier layer material in soft package packaging film for battery application | 浙江锂盾新能源材料有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-117363397-A | Pumping unit polish rod sealing grease and preparation method thereof | 中国石油化工股份有限公司 | 2024-01-09 | — | — | CN | disclosed |
| CN-117143343-B | Method for preparing ethyl silicone oil by sodium condensation method and ethyl silicone oil | 上海奇克氟硅材料有限公司 | 2023-12-26 | — | — | CN | disclosed |
| CN-117143343-A | Method for preparing ethyl silicone oil by sodium condensation method and ethyl silicone oil | 上海奇克氟硅材料有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-112533931-B | Process for preparing hydrocarbyloxysilanes | 美国陶氏有机硅公司 | 2023-11-28 | — | — | CN | disclosed |
| CN-116648353-A | Resin coated ultra-thin plate glass | 东丽株式会社 | 2023-08-25 | — | — | CN | disclosed |
| CN-116410470-A | Polyhydroxy cyclic polymer modified organic silicon resin, preparation method thereof and organic silicon pouring sealant | 湖南广信科技发展有限公司 | 2023-07-11 | — | — | CN | disclosed |
| WO-2023130014-A1 | RUBBER FORMULATIONS COMPRISING FUNCTIONALIZED CONJUGATED DIENE POLYMER, NATURAL RUBBER, AND REINFORCING FILLER | BRIDGESTONE CORPORATION (JP) | 2023-07-06 | — | — | WO | disclosed |
| US-11692060-B2 | Silane modified polymers with improved properties | Henkel IP & Holding GmbH (DE) | 2023-07-04 | — | — | US | disclosed |
| EP-3847177-B1 | METHOD FOR PREPARING HYDROCARBYLHYDROCARBYLOXYSILANES | DOW SILICONES CORP (US) | 2023-06-28 | — | — | EP | disclosed |
| WO-2023099331-A1 | COMPOSITION FOR SILICONE RUBBER MATERIALS | NITROCHEMIE ASCHAU GMBH (DE) | 2023-06-08 | — | — | WO | disclosed |
| CN-111386323-B | Novel system for applying a primer and bonding floor coverings | 科思创德国股份有限公司 | 2023-05-23 | — | — | CN | disclosed |
| EP-3924185-B1 | NEW SYSTEMS FOR THE PRIMING AND THE ADHESION OF FLOOR COVERINGS | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2023-01-25 | — | — | EP | disclosed |
| EP-3250576-B1 | ORGANIC ZINC COMPLEXES AS CATALYSTS FOR CONDENSATION REACTIONS | HENKEL AG & CO KGAA (DE) | 2022-07-20 | — | — | EP | disclosed |
| US-20220171095-A1 | COMPOSITION, FILM, STRUCTURAL BODY, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2022-06-02 | — | — | US | disclosed |
| US-11319335-B2 | Method for preparing hydrocarbylhydrocarbyloxysilanes | DOW SILICONES CORPORATION (US) | 2022-05-03 | — | — | US | disclosed |
| CN-111607356-B | Normal-temperature sprayed coating oil and preparation method and application thereof | 广州大象超薄路面技术开发有限公司 | 2022-03-29 | — | — | CN | disclosed |
| CN-110382609-B | Studless tire | 住友橡胶工业株式会社 | 2022-03-22 | — | — | CN | disclosed |
| EP-3924185-A1 | NEW SYSTEMS FOR PRIMING AND ADHESION OF FLOORING | Covestro Intellectual Property GmbH & Co. KG (DE) | 2021-12-22 | — | — | EP | disclosed |
| US-20210277033-A1 | METHOD FOR PREPARING HYDROCARBYLHYDROCARBYLOXYSILANES | DOW SILICONES CORPORATION | 2021-09-09 | — | — | US | disclosed |
| EP-3847177-A1 | METHOD FOR PREPARING HYDROCARBYLHYDROCARBYLOXYSILANES | Dow Silicones Corporation (US) | 2021-07-14 | — | — | EP | disclosed |
| CN-112533931-A | Process for preparing hydrocarbyloxysilanes | 美国陶氏有机硅公司 | 2021-03-19 | — | — | CN | disclosed |
| CN-108841435-B | Lubricating grease composition for ultrahigh-pressure concrete pump truck and preparation method thereof | 中国石油化工股份有限公司 | 2021-03-19 | — | — | CN | disclosed |
| WO-2021037349-A1 | MULTI-COMPONENT CROSSLINKABLE MATERIALS BASED ON ORGANYLOXYSILANE-TERMINATED POLYMERS AND EPOXY-FUNCTIONAL COMPOUNDS | WACKER CHEMIE AG (DE) | 2021-03-04 | — | — | WO | disclosed |
| US-20200392574-A1 | DNA ARRAY | COMPLETE GENOMICS INC (US) | 2020-12-17 | — | — | US | disclosed |
| CN-111607356-A | Normal-temperature sprayed coating oil and preparation method and application thereof | 广州大象超薄路面技术开发有限公司 | 2020-09-01 | — | — | CN | disclosed |
| WO-2020165125-A1 | NEW SYSTEMS FOR PRIMING AND ADHESION OF FLOORING | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2020-08-20 | — | — | WO | disclosed |
| EP-3615593-A1 | SILANE MODIFIED POLYMERS WITH IMPROVED PROPERTIES | Henkel IP & Holding GmbH (DE) | 2020-03-04 | — | — | EP | disclosed |
| US-20200055984-A1 | Silane Modified Polymers With Improved Properties | HENKEL AG & CO. KGAA (DE) | 2020-02-20 | — | — | US | disclosed |
| CN-110283582-A | For enhancing the nanometer surfactant of hydrocarbon harvesting, and the method for being formed and using the nanometer surfactant | 贝克休斯公司 | 2019-09-27 | — | — | CN | disclosed |
| CN-106103889-B | Nano-surfactants for enhanced hydrocarbon recovery, and methods of forming and using the same | 贝克休斯公司 | 2019-08-06 | — | — | CN | disclosed |
| CN-110021696-A | Illuminator and the luminescent film including it, light emitting diode and light emitting device | 乐金显示有限公司 | 2019-07-16 | — | — | CN | disclosed |
| CN-109912798-A | Organopolysiloxane compound and active energy ray-curable composition comprising it | 信越化学工业株式会社 | 2019-06-21 | — | — | CN | disclosed |
| CN-104593747-B | Dielectric Barrier Deposition Using Oxygen-Containing Precursors | 弗萨姆材料美国有限责任公司 | 2019-05-28 | — | — | CN | disclosed |
| US-10274488-B2 | Glycan arrays on PTFE-like aluminum coated glass slides and related methods | ACADEMIA SINICA (TW) | 2019-04-30 | — | — | US | disclosed |
| CN-108841435-A | A kind of super-pressure concrete mixer lubricant composition and preparation method | 中国石油化工股份有限公司 | 2018-11-20 | — | — | CN | disclosed |
| WO-2018200796-A1 | SILANE MODIFIED POLYMERS WITH IMPROVED PROPERTIES | Henkel IP & Holding GmbH (DE) | 2018-11-01 | — | — | WO | disclosed |
| US-10064422-B2 | Process for reducing the alcohol and/or sugar content of a beverage | D'ALCANTE B.V. (NL) | 2018-09-04 | — | — | US | disclosed |
| CN-107344980-A | Catalytic component, catalyst system and its application for olefinic polymerization | 中国石油化工股份有限公司 | 2017-11-14 | — | — | CN | disclosed |
| CN-107344976-A | Catalytic component, catalyst system and its application for olefinic polymerization | 中国石油化工股份有限公司 | 2017-11-14 | — | — | CN | disclosed |
| CN-107344979-A | Catalytic component, catalyst system and its application for olefinic polymerization | 中国石油化工股份有限公司 | 2017-11-14 | — | — | CN | disclosed |
| CN-104204945-B | Photosensitive black-colored resin composition and resin black matrix substrate | 东丽株式会社 | 2017-10-03 | — | — | CN | disclosed |
| CN-104479055-B | A kind of dialkoxy-magnesium support type ingredient of solid catalyst and catalyst | 任丘市利和科技发展有限公司 | 2017-06-06 | — | — | CN | disclosed |
| US-9644115-B2 | Fluorochemical coating composition and article treated therewith | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20170038378-A1 | GLYCAN ARRAYS ON PTFE-LIKE ALUMINUM COATED GLASS SLIDES AND RELATED METHODS | ACADEMIA SINICA (TW) | 2017-02-09 | — | — | US | disclosed |
| CN-106103889-A | Nano-surfactants for enhanced hydrocarbon recovery, and methods of forming and using the same | 贝克休斯公司 | 2016-11-09 | — | — | CN | disclosed |
| CN-104334629-B | Rubber composition for tire tread and pneumatic tire | 住友橡胶工业株式会社 | 2016-08-24 | — | — | CN | disclosed |
| US-20160213049-A1 | IMPROVED PROCESS FOR REDUCING THE ALCOHOL AND/OR SUGAR CONTENT OF A BEVERAGE | D'ALCANTE B.V. (NL) | 2016-07-28 | — | — | US | disclosed |
| CN-103022245-B | For photovoltaic passivation containing oxygen precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-03-02 | — | — | CN | disclosed |
| EP-2981603-A1 | IMPROVED PROCESS FOR REDUCING THE ALCOHOL AND/OR SUGAR CONTENT OF A BEVERAGE | D'Alcante B.V. (NL) | 2016-02-10 | — | — | EP | disclosed |
| US-20150275046-A1 | FLUOROCHEMICAL COATING COMPOSITION AND ARTICLE TREATED THEREWITH | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-01 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| CN-104593747-A | Dielectric Barrier Deposition Using Oxygen Containing Precursor | AIR PROD & CHEM | 2015-05-06 | — | — | CN | disclosed |
| CN-102207558-B | Hard coating film, polarized sheet, and image display device | SUMITOMO CO LTD | 2015-04-15 | — | — | CN | disclosed |
| CN-102947393-B | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2015-03-11 | — | — | CN | disclosed |
| CN-104334629-A | Tread rubber composition and pneumatic tire | SUMITOMO RUBBER IND | 2015-02-04 | — | — | CN | disclosed |
| CN-102232125-B | Dielectric barrier deposition using oxygen-containing precursors | AIR PROD & CHEM | 2015-01-28 | — | — | CN | disclosed |
| US-8940177-B2 | Method of manufacturing roll-shaped mold and method of manufacturing product having concave-convex microstructure on surface thereof | MITSUBISHI RAYON CO., LTD. (JP) | 2015-01-27 | — | — | US | disclosed |
| US-8877286-B2 | Method for producing optical film | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| WO-2014161998-A1 | IMPROVED PROCESS FOR REDUCING THE ALCOHOL AND/OR SUGAR CONTENT OF A BEVERAGE | D'ALCANTE B.V. (NL) | 2014-10-09 | — | — | WO | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8748511-B2 | Curable composition | HENKEL AG & CO., KGAA (DE) | 2014-06-10 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20140110371-A1 | METHOD OF MANUFACTURING ROLL-SHAPED MOLD AND METHOD OF MANUFACTURING PRODUCT HAVING CONCAVE-CONVEX MICROSTRUCTURE ON SURFACE THEREOF | MITSUBISHI RAYON CO., LTD. (JP) | 2014-04-24 | — | — | US | disclosed |
| EP-2688964-A1 | ALKYD-BASED COATING COMPOSITION | Akzo Nobel Chemicals International B.V. (NL) | 2014-01-29 | — | — | EP | disclosed |
| US-8637396-B2 | Dielectric barrier deposition using oxygen containing precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-01-28 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | DAICEL CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-20130265529-A1 | OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-20130247971-A1 | Oxygen Containing Precursors for Photovoltaic Passivation | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-09-26 | — | — | US | disclosed |
| US-8535761-B2 | Silsesquioxane derived hard, hydrophobic and thermally stable thin films and coatings for tailorable protective and multi-structured surfaces and interfaces | MAYATERIALS, INC. (US) | 2013-09-17 | — | — | US | disclosed |
| CN-103249762-A | Addition-curable metallosiloxane compound | DAICEL CORP | 2013-08-14 | — | — | CN | disclosed |
| EP-2178963-B1 | SILANE-CROSSLINKING ADHESIVE OR SEALANT COMPRISING N-SILYLALKYLAMIDES AND USE THEREOF | HENKEL AG & CO KGAA (DE) | 2013-07-17 | — | — | EP | disclosed |
| CN-103022245-A | Oxygen containing precursors for photovoltaic passivation | AIR PROD & CHEM | 2013-04-03 | — | — | CN | disclosed |
| CN-101639628-B | Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| CN-101646718-B | Curable resin composition, protective film, and method for forming protective film | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| CN-102947393-A | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2013-02-27 | — | — | CN | disclosed |
| EP-2417183-B1 | CURABLE COMPOSITION | HENKEL AG & CO KGAA (DE) | 2013-01-16 | — | — | EP | disclosed |
| CN-101442003-B | Organosilane-containing material for insulation film, method for producing the same, and semiconductor device | TOSOH CORP | 2012-12-26 | — | — | CN | disclosed |
| US-8322869-B2 | Optical film, polarizing plate, and image display apparatus | FUJIFILM CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-8313201-B2 | Optical film, polarizing plate and image display apparatus | FUJIFILM CORPORATION (JP) | 2012-11-20 | — | — | US | disclosed |
| WO-2012130763-A1 | ALKYD-BASED COATING COMPOSITION | AKZO NOBEL CHEMICALS INTERNATIONAL B.V. (NL) | 2012-10-04 | — | — | WO | disclosed |
| CN-101324755-B | Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof | JSR CORP | 2012-10-03 | — | — | CN | disclosed |
| US-20120237673-A1 | METHOD FOR PRODUCING OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| CN-101226329-B | Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof | JSR CORP | 2012-09-05 | — | — | CN | disclosed |
| CN-101515113-B | Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same | JSR CORP | 2012-07-18 | — | — | CN | disclosed |
| US-8206779-B2 | Method for producing laminate, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20120123016-A1 | CURABLE COMPOSITION | HENKEL AG & CO. KGAA (DE) | 2012-05-17 | — | — | US | disclosed |
| US-8130314-B2 | Solid-state image capturing apparatus, mounting method of solid-state image capturing apparatus, manufacturing method of solid-state image capturing apparatus, and electronic information device | SHARP KABUSHIKI KAISHA (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| EP-2417183-A1 | CURABLE COMPOSITION | Henkel AG & Co. KGaA (DE) | 2012-02-15 | — | — | EP | disclosed |
| US-8092872-B2 | Optical film, antireflection film, and polarizing plate and display device using the same | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| CN-102308020-A | Insulating film material, and film formation method utilizing the material, and insulating film | NAT INST FOR MATERIAL SCIENCE | 2012-01-04 | — | — | CN | disclosed |
| CN-101597303-B | Preparation method of hexaetcycletrisiloxane or triethyl trimethylcyclotrisiloxane | WUHAN CHEMICAL INDUSTRY RES INST CO LTD | 2011-11-16 | — | — | CN | disclosed |
| CN-102232125-A | Dielectric barrier deposition using oxygen-containing precursors | AIR PROD & CHEM | 2011-11-02 | — | — | CN | disclosed |
| US-8047662-B2 | Antiglare film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20110256312-A1 | OPTICAL FILM, ANTI-REFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2011-10-20 | — | — | US | disclosed |
| EP-2376672-A1 | DIELECTRIC BARRIER DEPOSITION USING OXYGEN CONTAINING PRECURSOR | Air Products and Chemicals, Inc. (US) | 2011-10-19 | — | — | EP | disclosed |
| US-20110244218-A1 | Coating composition, optical film, polarizing plate, and image display apparatus | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| CN-102207558-A | Hard coating film, polarized sheet, and image display device | SUMITOMO CO LTD | 2011-10-05 | — | — | CN | disclosed |
| EP-1758912-B1 | PREPARATION OF ORGANOSILANE ESTERS | EVONIK DEGUSSA GMBH (DE) | 2011-10-05 | — | — | EP | disclosed |
| US-8029855-B2 | Fine inorganic oxide dispersion, coating composition, optical film, antireflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2011-10-04 | — | — | US | disclosed |
| EP-2222751-B1 | CURABLE COMPOSITIONS CONSISTING OF SILANES WITH THREE HYDROLYSABLE GROUPS | HENKEL AG & CO KGAA (DE) | 2011-07-06 | — | — | EP | disclosed |
| CN-1956990-B | Process for preparing organosilane esters | DEGUSSA | 2010-12-22 | — | — | CN | disclosed |
| US-7848021-B2 | Optical film, antireflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2010-12-07 | — | — | US | disclosed |
| WO-2010115715-A1 | CURABLE COMPOSITION | HENKEL AG & CO. KGAA (DE) | 2010-10-14 | — | — | WO | disclosed |
| EP-2222751-A2 | CURABLE COMPOSITIONS CONSISTING OF SILANES WITH THREE HYDROLYSABLE GROUPS | Henkel AG & Co. KGaA (DE) | 2010-09-01 | — | — | EP | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| WO-2010065410-A1 | DIELECTRIC BARRIER DEPOSITION USING OXYGEN CONTAINING PRECURSOR | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-10 | — | — | WO | disclosed |
| US-20100136789-A1 | Dielectric Barrier Deposition Using Oxygen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-03 | — | — | US | disclosed |
| EP-2178963-A1 | SILANE-CROSSLINKING ADHESIVE OR SEALANT COMPRISING N-SILYLALKYLAMIDES AND USE THEREOF | Henkel AG & Co. KGaA (DE) | 2010-04-28 | — | — | EP | disclosed |
| US-7691459-B2 | Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | disclosed |
| US-20100079867-A1 | OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| CN-101646718-A | The formation method of curable resin composition, protective membrane and protective membrane | JSR CORP JP | 2010-02-10 | — | — | CN | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-101639628-A | Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element | JSR CORP JP | 2010-02-03 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| CN-101597303-A | The preparation method of Hexaethyl cyclotrisiloxane or triethyl trimethyl cyclotrisiloxane | WUHAN CHEMICAL INDUSTRY RES IN (CN) | 2009-12-09 | — | — | CN | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7622194-B2 | use of a transparent support having specific physical properties during the spreading of a functional layer makes it possible to control the spread and the penetration of solvent and hence provide a good quality optical film having little coating defects, reducing impact of residual solvent; LCDs | FUJIFILM CORPORATION (JP) | 2009-11-24 | — | — | US | disclosed |
| US-20090232992-A1 | reducing agent with reverse micelle solutions including metal salt at low temperature, coating core component with shell component by adding reverse micelle solution containing hydrolysate and/or partial condensate of polysiloxane or titanium-hydroxide containing compounds | FUJIFILM CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20090213462-A1 | OPTICAL FILM, POLARIZATION PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| CN-101515113-A | Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same | JSR CORP (JP) | 2009-08-26 | — | — | CN | disclosed |
| US-7572303-B2 | A symmetrical dialkyl carbonate, a metal, borong, silicon, or group 7 compound, a hydrogen or hydrocarbon-based fuel, an oxidizer, and a metallic cocatalyst; minimized hydrolysis; improved combustion and storage stability | OCTANE INTERNATIONAL, LTD. (US) | 2009-08-11 | — | — | US | disclosed |
| US-20090190009-A1 | Solid-state image capturing apparatus, mounting method of solid-state image capturing apparatus, manufacturing method of solid-state image capturing apparatus, and electronic information device | SHARP KABUSHIKI KAISHA (JP) | 2009-07-30 | — | — | US | disclosed |
| US-20090178589-A1 | Fine inorganic oxide dispersion, coating composition, optical film, antireflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2009-07-16 | — | — | US | disclosed |
| CN-101479664-A | Photosensitive materials and uses thereof | HONEYWELL INT INC (US) | 2009-07-08 | — | — | CN | disclosed |
| US-7542207-B2 | Antiglare and antireflection film polarizing plate and display device | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| US-20090135356-A1 | Anti-reflection film, polarizing plate, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| WO-2009065950-A2 | CURABLE COMPOSITIONS CONSISTING OF SILANES WITH THREE HYDROLYSABLE GROUPS | HENKEL AG & CO. KGAA (DE) | 2009-05-28 | — | — | WO | disclosed |
| CN-101442003-A | Organosilane-containing material for insulation film, method for producing the same, and semiconductor device | TOSOH CORP (JP) | 2009-05-27 | — | — | CN | disclosed |
| US-7531234-B2 | High refraction film, high refraction film-forming coating composition, anti-reflection film, protective film for polarizing plate, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20090091835-A1 | OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2009-04-09 | — | — | US | disclosed |
| US-7507850-B2 | Preparation of organosilane esters | DEGUSSA AG (DE) | 2009-03-24 | — | — | US | disclosed |
| US-20090061114-A1 | Anti-reflection film, polarizing plate, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2009-03-05 | — | — | US | disclosed |
| WO-2009022012-A1 | SILANE-CROSSLINKING ADHESIVE OR SEALANT COMPRISING N-SILYLALKYLAMIDES AND USE THEREOF | HENKEL AG & CO. KGAA (DE) | 2009-02-19 | — | — | WO | disclosed |
| WO-2008051029-A9 | AEROGEL SHEET AND METHOD FOR PREPARING THEREOF | KOREA IND TECH INST (KR) | 2009-01-29 | — | — | WO | disclosed |
| CN-101324755-A | Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof | JSR CORP (JP) | 2008-12-17 | — | — | CN | disclosed |
| CN-100444330-C | Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device | TOSOH CORP (JP) | 2008-12-17 | — | — | CN | disclosed |
| CN-100430828-C | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORP (JP) | 2008-11-05 | — | — | CN | disclosed |
| US-20080247045-A1 | ANTIGLARE FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| EP-1089132-B1 | Method of producing a conducting member for an image forming apparatus | CANON KK (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-7419707-B2 | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2008-09-02 | — | — | US | disclosed |
| US-20080206546-A1 | Comprising regularly arrayed domain structures formed on a substrate and having therein regularly arrayed pores with a size of 2 to 200 nm and nanoparticles incorporated into the pores; use as high-performance composite material, catalyst, nonlinear optical material and memory element | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| CN-101226329-A | Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof | JSR CORP (JP) | 2008-07-23 | — | — | CN | disclosed |
| US-20080131674-A1 | OPTICAL FILM, ANTIREFLECTION FILM, AND POLARIZING PLATE AND DISPLAY DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-06-05 | — | — | US | disclosed |
| EP-1490413-A4 | SOLID TITANIUM CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, CATALYST FOR OLEFIN POLYMERIZATION, AND PROCESS FOR OLEFIN POLYMERIZATION | MITSUI CHEMICALS INC (JP) | 2008-05-14 | — | — | EP | disclosed |
| WO-2008051029-A1 | AEROGEL SHEET AND METHOD FOR PREPARING THEREOF | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2008-05-02 | — | — | WO | disclosed |
| WO-2008044873-A1 | METHOD FOR PREPARING PERMANENTLY HYDROPHOBIC AEROGEL AND PERMANENTLY HYDROPHOBIC AEROGEL PREPARED BY USING THE METHOD | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2008-04-17 | — | — | WO | disclosed |
| US-20080069975-A1 | Optical film | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20080038472-A1 | Production method of laminate, laminate, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080014373-A1 | Optical Film, Producing Method Therefor, Polarizing Plate and Image Display Apparatus | FUJIFILM CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| US-20080013172-A1 | Method for Producing Light-Scattering Film, Polarizer Comprising Light-Scattering Film, and Liquid-Crystal Display Device Comprising Polarizer | FUJIFILM CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| US-20070291363-A1 | Optical Film | FUJIFILM CORPORATION (JP) | 2007-12-20 | — | — | US | disclosed |
| US-20070249785-A1 | Preparation of Organosilane Esters | EVONIK DEGUSSA GMBH (DE) | 2007-10-25 | — | — | US | disclosed |
| US-20070231610-A1 | Magnetic recording medium | FUJIFILM CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070207298-A1 | Optical film, anti-reflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070195431-A1 | Optical film, antireflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070176304-A1 | Regularly-aligned nano-structured material and method for producing the same | FUJIFILM CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070177271-A1 | Antireflection film, polarizing plate and image display | FUJIFILM CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070139781-A1 | Optical film, and polarizing plate, image display device and liquid crystal display device including the same | FUJIFILM CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20070116902-A1 | Optical film, anti-reflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-05-24 | — | — | US | disclosed |
| US-20070104896-A1 | Optical film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-05-10 | — | — | US | disclosed |
| CN-1956990-A | Process for preparing organosilane esters | DEGUSSA (DE) | 2007-05-02 | — | — | CN | disclosed |
| EP-1758912-A1 | PREPARATION OF ORGANOSILANE ESTERS | Degussa GmbH (DE) | 2007-03-07 | — | — | EP | disclosed |
| US-20070048457-A1 | Producing method of film having coated layer, film having coated layer, optical film, polarizing plate and liquid crystal display | FUJI FILM CORPORATION (JP) | 2007-03-01 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| EP-0954558-B1 | FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY | ORR WILLIAM C (US) | 2006-06-14 | — | — | EP | disclosed |
| CN-1717792-A | Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device | TOSOH CORP (JP) | 2006-01-04 | — | — | CN | disclosed |
| WO-2005118597-A1 | PREPARATION OF ORGANOSILANE ESTERS | DEGUSSA AG (DE) | 2005-12-15 | — | — | WO | disclosed |
| US-20050044778-A1 | Fuel compositions employing catalyst combustion structure | OCTANE INTERNATIONAL, LTD. | 2005-03-03 | — | — | US | disclosed |
| CN-1582414-A | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORP (JP) | 2005-02-16 | — | — | CN | disclosed |
| EP-1490413-A1 | SOLID TITANIUM CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, CATALYST FOR OLEFIN POLYMERIZATION, AND PROCESS FOR OLEFIN POLYMERIZATION | MITSUI CHEMICALS, INC. (JP) | 2004-12-29 | — | — | EP | disclosed |
| US-20040237384-A1 | Fuel compositions exhibiting improved fuel stability | OCTANE INTERNATIONAL, LTD. | 2004-12-02 | — | — | US | disclosed |
| CN-1462298-A | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORP (JP) | 2003-12-17 | — | — | CN | disclosed |
| US-6652608-B1 | Fuel compositions exhibiting improved fuel stability | OCTANE INTERNATIONAL, LTD. | 2003-11-25 | — | — | US | disclosed |
| WO-2003085006-A1 | SOLID TITANIUM CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, CATALYST FOR OLEFIN POLYMERIZATION, AND PROCESS FOR OLEFIN POLYMERIZATION | MITSUI CHEMICALS, INC (JP) | 2003-10-16 | — | — | WO | disclosed |
| WO-2003014248-A2 | ADHESION PROMOTING RESINS WITH CROSS-LINKING PROPERTIES | NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) | 2003-02-20 | — | — | WO | disclosed |
| US-6400919-B1 | Conducting member, process cartridge and image-forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2002-06-04 | — | — | US | disclosed |
| US-20020024011-A1 | Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same | NIKON CORPORATION | 2002-02-28 | — | — | US | disclosed |
| EP-1089132-A2 | Conducting member, process cartridge and image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1051461-A2 | FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE | ORR, William C. (US) | 2000-11-15 | — | — | EP | disclosed |
| WO-1999066009-A2 | FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE | ORR WILLIAM C (US) | 1999-12-23 | — | — | WO | disclosed |
| JP-H11315224-A | PHOTOCATALYTIC HYDROPHILIC COATING COMPOSITION, HYDROPHILIC COMPOSITE MATERIAL, AND ITS PRODUCTION | TOTO LTD | 1999-11-16 | — | — | JP | disclosed |
| US-5616440-A | Photosensitive member, electrophotographic apparatus using the photosensitive member, and process for producing the photosensitive member | FUJITSU, LTD. (JP) | 1997-04-01 | — | — | US | disclosed |
| WO-1995029939-A1 | ORGANOSILICON COMPOUND, ZIEGLER-NATTA CATALYST CONTAINING THE SAME AND PROCESS FOR POLYMERIZATION OF OLEFINS | TOHO TITANIUM CO., LTD. (JP) | 1995-11-09 | — | — | WO | disclosed |
| EP-0530360-A4 | — | PHILLIPS PETROLEUM CO (US) | 1995-04-26 | — | — | EP | disclosed |
| EP-0640109-A1 | PROCESS FOR PRODUCING ORGANOPOLYSILOXANE RESIN. | WACKER CHEMIE GMBH (DE) | 1995-03-01 | — | — | EP | disclosed |
| EP-0616261-A2 | Photosenstive member, electrophotographic apparatus using the photosensitive member, and process for producing the photosensitive member | FUJITSU LIMITED (JP) | 1994-09-21 | — | — | EP | disclosed |
| EP-0581545-A1 | Epoxysilicone release composition | GENERAL ELECTRIC COMPANY (US) | 1994-02-02 | — | — | EP | disclosed |
| WO-1993023455-A1 | PROCESS FOR PRODUCING ORGANOPOLYSILOXANE RESIN | WACKER-CHEMIE GMBH (DE) | 1993-11-25 | — | — | WO | disclosed |
| EP-0530360-A1 | GLASS-REINFORCED GRAFTED BRANCHED HIGHER ALPHA-OLEFINS | PHILLIPS PETROLEUM COMPANY (US) | 1993-03-10 | — | — | EP | disclosed |
| EP-0382258-A1 | Process for preparation of aminopropylalkoxysilane | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1990-08-16 | — | — | EP | disclosed |
| EP-0163052-A2 | Polymeric composition | Du Pont-Mitsui Polychemicals Co., Ltd. (JP) | 1985-12-04 | — | — | EP | disclosed |
| EP-0116091-A4 | A METHOD OF MAKING AN ABRASION RESISTANT COATING ON A SOLID SUBSTRATE AND ARTICLES PRODUCED THEREBY. | FOSTER GRANT CORP (US) | 1985-09-26 | — | — | EP | disclosed |
| US-4508631-A | Dehydrating refrigerant | Packo, Joseph J. (US) | 1985-04-02 | — | — | US | disclosed |
| EP-0116091-A1 | A METHOD OF MAKING AN ABRASION RESISTANT COATING ON A SOLID SUBSTRATE AND ARTICLES PRODUCED THEREBY | FOSTER GRANT CORPORATION (US) | 1984-08-22 | — | — | EP | disclosed |
| WO-1984000722-A1 | A METHOD OF MAKING AN ABRASION RESISTANT COATING ON A SOLID SUBSTRATE AND ARTICLES PRODUCED THEREBY | FOSTER GRANT CORP (US) | 1984-03-01 | — | — | WO | disclosed |
| EP-0018738-B1 | SOLID TITANIUM CATALYST COMPONENT AND USE THEREOF IN THE PRODUCTION OF OLEFIN POLYMERS OR COPOLYMERS | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1983-05-11 | — | — | EP | disclosed |
| EP-0060368-A1 | Heat-hardening elastomeric organopolysiloxane pastes | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1982-09-22 | — | — | EP | disclosed |
| US-4290915-A | ALSO COMPRISING A MAGNESIUM, HALOGEN AND ELECTRON DONOR COMPONENT | MITSUI PETROCHEMICAL INDUSTRIES LTD. (JP) | 1981-09-22 | — | — | US | disclosed |
| EP-0018738-A1 | Solid titanium catalyst component and use thereof in the production of olefin polymers or copolymers | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1980-11-12 | — | — | EP | disclosed |
| EP-0018738-A1 | Solid titanium catalyst component and use thereof in the production of olefin polymers or copolymers | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1980-11-12 | — | — | EP | disclosed |