SCHEMBL4257863

SCHEMBL4257863

CC(C)C(N)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL320286 0.82
SCHEMBL144710 0.78
SCHEMBL3644046 0.78
SCHEMBL14840317 0.78
SCHEMBL993048 0.78
SCHEMBL6073309 0.78
SCHEMBL11777222 0.75
Hydrochloric Acid SCHEMBL718322 0.75
Water SCHEMBL190438 0.75
Fluoride SCHEMBL190901 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8469110-B2 Methods for increasing oil production James K. and Mary A. Sanders Family L.L.C. (US) 2013-06-25 US claimed
WO-2009123768-A2 NANOCARRIER AND NANOGEL COMPOSITIONS RUTGERS UNIVERSITY (US) 2009-10-08 WO claimed
EP-1266956-B1 Composition for washing a polishing pad and method for washing a polishing pad JSR CORP (JP) 2006-04-19 EP claimed
EP-0269949-B1 PROCESS FOR PRODUCING A HIGH PURITY QUATERNARY AMMONIUM HYDROXIDE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1993-04-21 EP claimed
US-4776929-A Process for production of quaternary ammonium hydroxides MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1988-10-11 US claimed
WO-2023167114-A1 SKIN CLEANSER COMPOSITION ライオン株式会社 2023-09-07 WO disclosed
WO-2023276272-A1 LIQUID SKIN CLEANSER COMPOSITION ライオン株式会社 2023-01-05 WO disclosed
WO-2022270014-A1 SKIN CLEANING AGENT COMPOSITION ライオン株式会社 2022-12-29 WO disclosed
WO-2022264507-A1 LIQUID SKIN CLEANSER COMPOSITION ライオン株式会社 2022-12-22 WO disclosed
WO-2022137677-A1 LIQUID SKIN CLEANSER COMPOSITION ライオン株式会社 2022-06-30 WO disclosed
US-11201321-B1 LimMOxFy shell formation on cathode ceramic particle for Li ion battery through onium metal oxide fluoride precursor SACHEM, INC. (US) 2021-12-14 US disclosed
US-20210367227-A1 LimMOxFy SHELL FORMATION ON CATHODE CERAMIC PARTICLE FOR LI ION BATTERY THROUGH ONIUM METAL OXIDE FLUORIDE PRECURSOR SACHEM, INC. 2021-11-25 US disclosed
EP-2462924-A2 Improvements in or relating to amphoteric liposomes. Marina Biotech, Inc. (US) 2012-06-13 EP disclosed
EP-1911443-A1 Amphoteric liposomes, method of formulating an amphoteric liposome and a method of loading an amphoteric liposome Novosom AG (DE) 2008-04-16 EP disclosed
WO-2007001848-A2 HIGH REFRACTIVE INDEX FLUIDS WITH LOW ABSORPTION FOR IMMERSION LITHOGRAPHY SACHEM, INC. (US) 2007-01-04 WO disclosed
US-5576459-A Quaternary nitrogen or phosphorus chirates SACHEM, INC. (US) 1996-11-19 US disclosed
EP-0269949-B1 PROCESS FOR PRODUCING A HIGH PURITY QUATERNARY AMMONIUM HYDROXIDE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1993-04-21 EP disclosed
US-4776929-A Process for production of quaternary ammonium hydroxides MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1988-10-11 US disclosed
EP-0269949-A2 Process for producing a high purity quaternary ammonium hydroxide MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1988-06-08 EP disclosed
EP-0264079-A2 Integral multilayer analytical element FUJI PHOTO FILM CO., LTD. (JP) 1988-04-20 EP disclosed