Water

Water

SCHEMBL190438

CC(C)C(C)(N)O.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL144710 0.96
SCHEMBL3644046 0.96
Hydrochloric Acid SCHEMBL718322 0.92
Hydrogen Peroxide SCHEMBL10659944 0.92
Fluoride SCHEMBL190901 0.92
SCHEMBL28991824 0.83 ALDH1A1 (0.37)
Perchlorate SCHEMBL6561573 0.81 ALDH1A1 (0.35)
Formic Acid SCHEMBL3812926 0.81 ALDH1A1 (0.35)
Acetic Acid SCHEMBL319666 0.81 FFAR3 (0.41)
Oxalic Acid SCHEMBL1052168 0.81 ALDH1A1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 472 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119798586-A Preparation method of polyisocyanate composition 万华化学集团股份有限公司 2025-04-11 CN claimed
CN-115651162-B Polyisocyanate composition with low free monomer, high compatibility and good dilution stability and preparation method thereof 万华化学集团股份有限公司 2025-02-18 CN claimed
CN-119144236-A Polishing solution and preparation method thereof 江苏山水半导体科技有限公司 2024-12-17 CN claimed
CN-119126507-A Photoresist stripping liquid, preparation method and application thereof 浙江奥首材料科技有限公司 2024-12-13 CN claimed
US-20240230608-A9 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2024-07-11 US claimed
CN-118165221-A Allophanate composition, polyisocyanate composition, and preparation methods and applications thereof 万华化学(宁波)有限公司 2024-06-11 CN claimed
CN-118165226-A Preparation method of polyisocyanate composition 万华化学(宁波)有限公司 2024-06-11 CN claimed
US-20240133852-A1 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2024-04-25 US claimed
CN-113698572-B Polyisocyanate composition, preparation method and application 万华化学(宁波)有限公司 2023-12-19 CN claimed
CN-114249868-B Storage-stable polyisocyanate composition and preparation method thereof 万华化学集团股份有限公司 2023-12-19 CN claimed
US-20040224866-A1 Cleaning solution and cleaning process using the solution MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-11-11 US claimed
US-20040142835-A1 Washing liquid for semiconductor substrate SUMITOMO CHEMICAL COMPANY, LIMITED 2004-07-22 US claimed
US-6432621-B1 DEVELOPER IS REACTION PRODUCT OF BASE AND PHENOLIC CARBOXYLIC COMPOUND KAO CORPORATION (JP) 2002-08-13 US claimed
US-6152148-A APPLYING MECHANICAL FRICTIONAL FORCE TO THE SURFACE OF THE WAFER BEARING A POLY(ARYLENE ETHER) DIELECTRIC LAYER WHILE APPLYING TO THE SURFACE AN ALKALINE AQUEOUS SOLUTION COMPRISING A SURFACTANT AND A TETRAALKYLAMMONIUM HYDROXYDE HONEYWELL, INC. (US) 2000-11-28 US claimed
WO-2000014785-A1 A METHOD FOR CLEANING ORGANIC DIELECTRIC FILM CONTAINING SEMICONDUCTOR WAFERS ALLIEDSIGNAL INC. (US) 2000-03-16 WO claimed
EP-0792890-B1 Process for preparing phosphonate-terminated polymers ROHM & HAAS (US) 1999-12-29 EP claimed
US-5866664-A UNSATURATED CARBOXYLIC ACID MONOMERS ROHM AND HAAS COMPANY (US) 1999-02-02 US claimed
US-5814432-A FORMING RADIATION SENSITIVE LAYER ON SUBSTRATE, CONTAINS FIRST COMPONENT WHICH GENERATES ACID BY CHEMICAL RADIATION AND SECOND COMPONENT THAT HAS BOND BEING DECOMPOSED BY GENERATED ACID KABUSHIKI KAISHA TOSHIBA (JP) 1998-09-29 US claimed
US-5756267-A QUATERNARY AMMONIUM BASES WITH SURFACTANTS TO DEVELOP SHARP IMAGES FUJI PHOTO FILM CO., LTD. (JP) 1998-05-26 US claimed
EP-0792890-A1 Process for preparing phosphonate-terminated polymers ROHM AND HAAS COMPANY (US) 1997-09-03 EP claimed