SCHEMBL4261985

SCHEMBL4261985

C=C(F)C(F)(F)OC(F)(C(=O)OCC)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.34
CYP4A11 Q02928 2/20 0.34
POLB P06746 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
MAPT P10636 6/20 0.33
HIF1A Q16665 1/20 0.33
TSHR P16473 2/20 0.32
ALDH1A1 P00352 2/20 0.32
PKM P14618 2/20 0.32
KDM4E B2RXH2 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
THRB P10828 2/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6152924 0.88 POLB (0.30) POLBNPSR1
SCHEMBL8465941 0.80 ALDH1A1 (0.33) ALDH1A1
SCHEMBL12733084 0.74 ALDH1A1 (0.40) CYP4F2CYP4A11POLBNPSR1MAPT
SCHEMBL4258788 0.74 TET2 (0.31)
SCHEMBL11281286 0.74 SMN1; SMN2 (0.40) CYP4F2CYP4A11POLBNPSR1MAPT
Ammonia Solution, Strong SCHEMBL4161928 0.72 TET2 (0.31)
Ammonia Solution, Strong SCHEMBL30373200 0.72 TET2 (0.31)
SCHEMBL10387482 0.70 CYP4F2 (0.44) CYP4F2CYP4A11TSHRALDH1A1PKM
SCHEMBL11204992 0.69 HTT (0.40) CYP4F2CYP4A11POLBNPSR1MAPT
SCHEMBL3676353 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090142715-A1 LAMINATED RESIST USED FOR IMMERSION LITHOGRAPHY DAIKIN INDUSTRIES LTD. (JP) 2009-06-04 US disclosed
US-20070166639-A1 Laminated resist used for immersion lithography DAIKIN INDUSTRIES LTD. (JP) 2007-07-19 US disclosed