SCHEMBL4264149

SCHEMBL4264149

COc1c(Br)cc(Br)c(C=O)c1Br

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.52
CA4 P22748 2/20 0.52
ERN1 O75460 3/20 0.47
PRKDC P78527 1/20 0.46
HPGD P15428 2/20 0.39
MAPT P10636 1/20 0.39
HSD17B10 Q99714 1/20 0.38
TPMT P51580 1/20 0.37
ALDH1A1 P00352 3/20 0.36
TSHR P16473 1/20 0.36
APOBEC3A P31941 1/20 0.36
HTT P42858 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
CA1 P00915 1/20 0.36
CA6 P23280 1/20 0.36
NQO2 P16083 1/20 0.36
GPR35 Q9HC97 2/20 0.36
MAPK1 P28482 1/20 0.36
LMNA P02545 1/20 0.34
TTR P02766 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25286626 0.83 ERN1 (0.44) CA2CA4ERN1PRKDCHPGD
SCHEMBL30771217 0.78 MAPT (0.44) CA2CA4ERN1PRKDCMAPT
SCHEMBL15961260 0.76 PTPN1 (0.48) CA2CA4ERN1PRKDCMAPT
SCHEMBL18270044 0.76 ERN1 (0.41) CA2CA4ERN1PRKDCMAPT
SCHEMBL8684241 0.74 PTPN1 (0.41) CA2CA4ERN1PRKDCMAPT
SCHEMBL27303408 0.73 PRKDC (0.43) CA2CA4ERN1PRKDCHPGD
SCHEMBL2588646 0.72 MAPT (0.55) CA2CA4ERN1PRKDCHPGD
SCHEMBL31643963 0.72 PRKDC (0.55) ERN1PRKDCHPGDMAPTALDH1A1
SCHEMBL5881501 0.72 ERN1 (0.53) CA2CA4ERN1PRKDCHPGD
SCHEMBL4950948 0.72 PRKDC (0.42) CA2CA4ERN1PRKDCHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
EP-1472259-B1 TETRAPYRROLIC MACROCYCLES AS PHOTODYNAMIC AGENTS CIPAN COMP IND PROD (PT) 2009-09-02 EP disclosed