SCHEMBL4265129

SCHEMBL4265129

O/N=C1/CC/C(=N\O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4265130 1.00
SCHEMBL13656494 1.00
SCHEMBL17988305 0.86 TSHR (0.61)
SCHEMBL4267933 0.84 TSHR (0.67)
Bicarbonate SCHEMBL11025592 0.72
SCHEMBL1201175 0.71 CYP2A6 (0.46)
SCHEMBL1201177 0.71 CYP2A6 (0.46)
SCHEMBL31563930 0.69 TSHR (0.32)
SCHEMBL757463 0.69 TSHR (0.50)
SCHEMBL1434601 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7604919-B2 Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness DONGJIN SEMICHEM CO., LTD. (KR) 2009-10-20 US disclosed
US-20080070161-A1 Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness DONGJIN SEMICHEM CO., LTD. (KR) 2008-03-20 US disclosed