Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.67 |
| ▸ | CASP1 | P29466 | 1/20 | 0.67 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL11025592 | 0.86 | — | — | |
| SCHEMBL9639780 | 0.84 | — | — | |
| SCHEMBL4265130 | 0.84 | — | — | |
| SCHEMBL264698 | 0.84 | — | — | |
| SCHEMBL13656494 | 0.84 | — | — | |
| SCHEMBL4265129 | 0.84 | — | — | |
| Cyclohexanone Oxime SCHEMBL11884936 | 0.81 | TSHR (1.00) | TSHRCASP1CHRNA7ESR2ALDH1A1 | |
| SCHEMBL3190316 | 0.81 | TSHR (1.00) | TSHRCASP1CHRNA7ESR2ALDH1A1 | |
| SCHEMBL3474721 | 0.81 | TSHR (1.00) | TSHRCASP1CHRNA7ESR2ALDH1A1 | |
| SCHEMBL1025656 | 0.81 | TSHR (1.00) | TSHRCASP1CHRNA7ESR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101278364-B | Electrolytic solution for electrolytic capacitor and electrolytic capacitor | MITSUBISHI CHEM CORP | 2012-09-05 | — | — | CN | claimed |
| CN-101278364-A | Electrolytic solution for electrolytic capacitor and electrolytic capacitor | MITSUBISHI CHEM CORP (JP) | 2008-10-01 | — | — | CN | claimed |
| CN-107018669-A | The manufacture method of etchant and its bulking liquor, the method for coarsening surface of magnesium component and magnesium-resin composite body | MEC股份有限公司 | 2017-08-04 | — | — | CN | disclosed |
| US-9411226-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9411226-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| CN-102841061-B | Method for detecting nickelous ions | NINGBO INST MAT TECH & ENG CAS | 2015-06-03 | — | — | CN | disclosed |
| US-7604919-B2 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-10-20 | — | — | US | disclosed |
| US-7604919-B2 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-10-20 | — | — | US | disclosed |
| US-7604919-B2 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-10-20 | — | — | US | disclosed |
| US-20080070161-A1 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-03-20 | — | — | US | disclosed |
| US-20080070161-A1 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-03-20 | — | — | US | disclosed |
| US-20080070161-A1 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-03-20 | — | — | US | disclosed |
| US-3960822-A | Crosslinking polymers with chloronitroso compounds | BASF WYANDOTTE CORPORATION (US) | 1976-06-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080070161-A1 | Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness | ALKBH5, ALKBH2, ALKBH3 | TSHR 2819/4885CASP1 2870/4885CHRNA7 4487/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.