⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Peroxide SCHEMBL5072804 | 0.96 | — | — | |
| Methylamine SCHEMBL28198928 | 0.93 | — | — | |
| SCHEMBL6285125 | 0.89 | CA1 (0.31) | — | |
| Sulfurous Acid SCHEMBL28203988 | 0.87 | — | — | |
| Guanidine SCHEMBL2057451 | 0.78 | CA1 (0.55) | — | |
| Guanidine SCHEMBL735066 | 0.78 | — | — | |
| Guanidine SCHEMBL11341418 | 0.75 | — | — | |
| Guanidine SCHEMBL11335102 | 0.75 | — | — | |
| Guanidine SCHEMBL3140647 | 0.75 | CA1 (0.39) | — | |
| SCHEMBL1261401 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5975 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12532687-B2 | Cleaning solution and method of cleaning wafer | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-01-20 | — | — | US | claimed |
| EP-4677103-A1 | IMPROVED CELLULOSE FOR BIOETHANOL PRODUCTION | SixRing Inc. (CA) | 2026-01-14 | — | — | EP | claimed |
| EP-4413055-B1 | STABILIZED RHEOLOGY MODIFIER EMULSIONS | LUBRIZOL ADVANCED MAT INC (US) | 2025-12-03 | — | — | EP | claimed |
| US-12487527-B2 | Photoresist developer and method of developing photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-12-02 | — | — | US | claimed |
| US-20250362598-A1 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-11-27 | — | — | US | claimed |
| US-12469692-B2 | Cleaning solution and method of cleaning wafer | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-11-11 | — | — | US | claimed |
| US-20250313958-A1 | METHOD FOR NANO ETCHING OF COPPER AND COPPER ALLOY SURFACES | Atotech Deutschland GmbH & Co. KG (DE) | 2025-10-09 | — | — | US | claimed |
| US-20250299955-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION METHOD | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-09-25 | — | — | US | claimed |
| EP-3685160-B1 | IMPROVED IMMUNOFLUORESCENCE ASSAYS | VECTOR LABORATORIES INC (US) | 2025-08-06 | — | — | EP | claimed |
| EP-4593786-A1 | STABLE SKIN CARE COMPOSITIONS CONTAINING A RETINOID | The Procter & Gamble Company (US) | 2025-08-06 | — | — | EP | claimed |
| US-4338238-A | Process for the production of polychloroprene latices rich in solid matter | BAYER AKTIENGESELLSCHAFT (DE) | 1982-07-06 | — | — | US | claimed |
| US-4314810-A | Compositions suitable for use in dyeing hair obtained from the reaction of a polyhydroxybenzene and an oxidative dyestuff precursor of the para type | L'OREAL (FR) | 1982-02-09 | — | — | US | claimed |
| US-4311551-A | Composition and method for etching copper substrates | PHILIP A. HUNT CHEMICAL CORP. (US) | 1982-01-19 | — | — | US | claimed |
| US-4241195-A | COATING OF FORMAMIDINESULFINIC ACID, METHENAMINE MANDELATE, IN RESINOUS CARRIER | WESTINGHOUSE ELECTRIC CORP. (US) | 1980-12-23 | — | — | US | claimed |
| US-4163091-A | IN THE PRESENCE OF AN INORGANIC PEROXY COMPOUND, FORMAMIDINE SULFINIC ACID AND ANTHRAQUINONE-2-SULFONIC ACID, ALKALI METHAL SALT | BAYER AKTIENGESELLSCHAFT (DE) | 1979-07-31 | — | — | US | claimed |
| US-4149161-A | Protecting electrical apparatus with gas generating compounds | WESTINGHOUSE ELECTRIC CORP. (US) | 1979-04-10 | — | — | US | claimed |
| US-4089855-A | Process for the stereoselective reduction of 6- and 8-keto morphine and morphinan derivatives with formamidinesulfinic acid and compounds obtained thereby | CORNELL RESEARCH FOUNDATION, INC. (US) | 1978-05-16 | — | — | US | claimed |
| US-4036715-A | ELECTRODEPOSITION; LOW CURRENT DENSITY | EASTMAN KODAK COMPANY (US) | 1977-07-19 | — | — | US | claimed |
| US-3967444-A | Technique for preventing afterburning of the inert components of solid-propelled rocket motors by using formamidinesulfinic acid in the binder of the inert components | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1976-07-06 | — | — | US | claimed |
| US-3933755-A | Melamine, formaldehyde, thiourea and diol ether thermosetting resin and method of preparing the same | SUDDEUTSCHE KALKSTICKSTOFF-WERKE AG (DT) | 1976-01-20 | — | — | US | claimed |