Boric Acid

Boric Acid

SCHEMBL4278315

OB(O)O.[GaH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Boric Acid SCHEMBL21951477 1.00 LMNA (0.80)
Boric Acid SCHEMBL14937392 0.91
Boric Acid SCHEMBL14937654 0.91
Boric Acid SCHEMBL7191440 0.91
Boric Acid SCHEMBL14937183 0.91
Boric Acid SCHEMBL27583553 0.91
Boric Acid SCHEMBL1483674 0.89 LMNA (1.00)
Boric Acid SCHEMBL168347 0.89 LMNA (1.00)
Boric Acid SCHEMBL2835168 0.89 LMNA (1.00)
Boric Acid SCHEMBL21951406 0.89 LMNA (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114068316-A Acceptor source material for semiconductor diffusion, acceptor source diffusion paper and application thereof 济宁九德半导体科技有限公司 2022-02-18 CN claimed
CN-116936768-A Composite positive electrode material and preparation method and application thereof 华中科技大学 2023-10-24 CN disclosed
CN-114068316-A Acceptor source material for semiconductor diffusion, acceptor source diffusion paper and application thereof 济宁九德半导体科技有限公司 2022-02-18 CN disclosed
CN-114068316-A Acceptor source material for semiconductor diffusion, acceptor source diffusion paper and application thereof 济宁九德半导体科技有限公司 2022-02-18 CN disclosed
US-9245779-B2 Method of preparing thin film, thin film, apparatus for preparing thin film, and electronic device including thin film SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-01-26 US disclosed
US-20130072899-A1 Pharmaceutical Formulations for Iontophoretic Delivery of Gallium Nitric BloTherapeutics, Inc. (US) 2013-03-21 US disclosed
US-20130034708-A1 METHOD OF PREPARING THIN FILM, THIN FILM, APPARATUS FOR PREPARING THIN FILM, AND ELECTRONIC DEVICE INCLUDING THIN FILM SAMSUNG DISPLAY CO., LTD. (KR) 2013-02-07 US disclosed
EP-2138608-A1 Process for preparing a transparent and conductive film on a substrate Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO (NL) 2009-12-30 EP disclosed
WO-2009155321-A1 PHARMACEUTICAL FORMULATIONS FOR IONTOPHORETIC DELIVERY OF GALLIUM TRANSPORT PHARMACEUTICALS, INC. (US) 2009-12-23 WO disclosed
EP-0855371-A1 Method for manufacturing glass preform and glass fiber HOYA CORPORATION (JP) 1998-07-29 EP disclosed
EP-0854119-A2 Etchant and method for etching chalcogenide glass and optical member having smooth surface HOYA CORPORATION (JP) 1998-07-22 EP disclosed