SCHEMBL428351

SCHEMBL428351

CCC(C)C(O)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27844312 1.00
SCHEMBL14257264 1.00
SCHEMBL14928532 1.00
SCHEMBL31509260 1.00
Acetic Acid SCHEMBL15261666 0.86 TRPA1 (0.43)
SCHEMBL1301172 0.83 TSHR (0.47)
SCHEMBL28157993 0.83 TSHR (0.47)
SCHEMBL4883986 0.83 TSHR (0.47)
SCHEMBL106965 0.80 TSHR (0.44)
SCHEMBL13210533 0.80 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 327 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108125201-B Black pepper essence 浙江绿晶生物科技股份有限公司 2021-04-20 CN claimed
CN-108125201-A Black pepper essence 浙江绿晶香精有限公司 2018-06-08 CN claimed
CN-103376660-B Containing the photo-corrosion-resisting agent composition for protecting hydroxyl and its pattern formation method is used for negative development 国际商业机器公司 2017-12-05 CN claimed
US-9670218-B2 Methods for making 3-O-protected morphinones and 3-O-protected morphinone dienol carboxylates PURDUE PHARMA L.P. (US) 2017-06-06 US claimed
US-9316916-B2 Method to mitigate resist pattern critical dimension variation in a double-exposure process Globalfounries Inc. (KY) 2016-04-19 US claimed
US-20150239898-A1 METHODS FOR MAKING 3-O-PROTECTED MORPHINONES AND 3-O-PROTECTED MORPHINONE DIENOL CARBOXYLATES EURO-CELTIQUE S.A. (LU) 2015-08-27 US claimed
US-20140072915-A1 PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-13 US claimed
CN-103376660-A Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof IBM 2013-10-30 CN claimed
CN-103201680-A Photoresist composition for negative development and pattern forming method using the same IBM 2013-07-10 CN claimed
US-20130164680-A1 PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-06-27 US claimed
JP-2008519297-A 2008-06-05 JP claimed
US-20080032228-A1 TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-02-07 US claimed
CN-101084467-A Silicon containing TARC/barrier layer IBM (US) 2007-12-05 CN claimed
EP-1820061-A1 SILICON CONTAINING TARC/BARRIER LAYER International Business Machines Corporation (US) 2007-08-22 EP claimed
WO-2006057782-A1 SILICON CONTAINING TARC/BARRIER LAYER INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-06-01 WO claimed
US-20060093959-A1 Silicon containing TARC / barrier layer GLOBALFOUNDRIES U.S. INC. 2006-05-04 US claimed
EP-1507520-A1 COMBINATION OF SELECTED OPIOIDS WITH OTHER ACTIVE SUBSTANCES FOR USE IN THE THERAPY OF URINARY INCONTINENCE Grünenthal GmbH (DE) 2005-02-23 EP claimed
WO-2003099268-A1 COMBINATION OF SELECTED OPIOIDS WITH OTHER ACTIVE SUBSTANCES FOR USE IN THE THERAPY OF URINARY INCONTINENCE Grünenthal GmbH (DE) 2003-12-04 WO claimed
US-4748283-A POLYMERIZATION CATALYSTS LITHIUM CORPORATION OF AMERICA (US) 1988-05-31 US claimed
US-4162271-A CATALYST SELECTIVITY THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-07-24 US claimed