SCHEMBL42899

SCHEMBL42899

O=C=Nc1cccc(Oc2ccccc2)c1N=C=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.43
LMNA P02545 2/20 0.40
KMT2A Q03164 2/20 0.40
GAA P10253 1/20 0.40
HTT P42858 1/20 0.38
CTNNB1 P35222 1/20 0.38
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
ALDH1A1 P00352 3/20 0.37
TSHR P16473 2/20 0.37
HPGD P15428 2/20 0.37
SLC6A2 P23975 1/20 0.37
SLC6A4 P31645 1/20 0.37
DPP4 P27487 1/20 0.36
LTA4H P09960 1/20 0.35
KDM4E B2RXH2 1/20 0.35
POLB P06746 1/20 0.35
HRH1 P35367 1/20 0.34
TSPO P30536 1/20 0.34
RIPK1 Q13546 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28056128 0.88 CYP3A4 (0.50) CYP3A4GABRA1GABRB2ALDH1A1HPGD
SCHEMBL10610591 0.87 CYP3A4 (0.41) CYP3A4LMNAKMT2AGAAHTT
SCHEMBL3652399 0.87 CYP3A4 (0.37) CYP3A4LMNAKMT2AGAAHTT
SCHEMBL673041 0.86 KMT2A (0.44) CYP3A4LMNAKMT2AGAAHTT
SCHEMBL7181943 0.81 CYP3A4 (0.36) CYP3A4GABRA1GABRB2
SCHEMBL7128955 0.79 CYP3A4 (0.46) CYP3A4LMNAKMT2AGAACTNNB1
SCHEMBL2169591 0.77 CYP3A4 (0.52) CYP3A4LMNAKMT2AGABRA1GABRB2
SCHEMBL10788001 0.76 KMT2A (0.37) CYP3A4LMNAKMT2AGAAHTT
SCHEMBL1415413 0.76 ALDH1A1 (0.46) CYP3A4LMNAKMT2AGAAHTT
SCHEMBL109280 0.75 CYP3A4 (0.62) CYP3A4GABRA1GABRB2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3285 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117004178-B Toughened and modified compound and its preparing process Jiangxi Lianmao Electronic Technology Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-121108414-B Raw material composition for preparing medium-high refractive index polyurethane optical material 江苏视科新材料股份有限公司 2026-05-12 CN claimed
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
EP-4626944-A1 SUSTAINABLE WOOD ADHESIVE FORMULATION Huntsman International LLC (US) 2025-10-08 EP claimed
CN-119613653-A Modified polyurethane optical material and preparation method thereof 江苏视科新材料股份有限公司 2025-03-14 CN claimed
CN-119591821-A Modified polyurethane polymer optical material and preparation method and application thereof 江苏视科新材料股份有限公司 2025-03-11 CN claimed
CN-119529649-A Color vision correction resin lens coating material and preparation method thereof 江苏视科新材料股份有限公司 2025-02-28 CN claimed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO claimed
CN-118620520-A Polyamide imide varnish cured at low temperature and preparation method and application thereof 宁波博雅聚力新材料科技有限公司 2024-09-10 CN claimed
CN-118620501-A Anti-freezing and anti-thawing beautifying mark polyaspartic root protective material applied to pumped storage power station and preparation method thereof 中水东北勘测设计研究有限责任公司 2024-09-10 CN claimed
US-4695604-A Electron beam curable polyuethane polymers for magnetic tape applications MORTON THIOKOL, INC. (US) 1987-09-22 US claimed
EP-0042622-B1 Spiro[2,2,6,6-tetramethyl-piperidine-4,2'-(1',3'-dioxo(ol)an]-derivatives and stabilizers for synthetic polymers ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1987-08-19 EP claimed
EP-0188324-A2 Magnetic coating comprising electron beam curable polyurethanes MORTON INTERNATIONAL, INC. (US) 1986-07-23 EP claimed
EP-0027620-B1 2,2,6,6-TETRAALKYL-4-PIPERIDYL-BIS-SPIRO-ETHERS AND SYNTHETIC POLYMERS STABILISED THEREWITH ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1985-07-24 EP claimed
EP-0033181-A1 Mixtures of branched-chain amines and derivatives thereof AKZO N.V. (NL) 1981-08-05 EP claimed
US-RE30067-E Iminoimidazolidinedione and parabanic acid polymers containing imide groups EXXON RESEARCH & ENGINEERING CO. (US) 1979-08-07 US claimed
US-4087414-A Process for producing a flame retardant isocyanurate resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JA) 1978-05-02 US claimed
US-3948941-A NITRILE, FROM CARBOXYLIC ANHYDRIDES AND ISOCYANATES EXXON RESEARCH AND ENGINEERING COMPANY (US) 1976-04-06 US claimed
US-3936584-A Formation of polyparabanic acid coatings and films by solvent treatment of powdered layer EXXON RESEARCH AND ENGINEERING COMPANY (US) 1976-02-03 US claimed
US-3933758-A Iminoimidazolidinedione and parabanic acid polymers containing imide groups EXXON RESEARCH AND ENGINEERING COMPANY (US) 1976-01-20 US claimed