Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL9510918 | 0.94 | — | — | |
| SCHEMBL1167438 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL27381085 | 0.72 | — | — | |
| SCHEMBL27306963 | 0.71 | — | — | |
| SCHEMBL27269849 | 0.69 | — | — | |
| SCHEMBL27325134 | 0.69 | — | — | |
| SCHEMBL27366957 | 0.69 | — | — | |
| SCHEMBL27814134 | 0.69 | — | — | |
| SCHEMBL27323838 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL27381087 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10964534-B2 | Enhanced thin film deposition | ASM INTERNATIONAL (NL) | 2021-03-30 | — | — | US | disclosed |
| US-20190267231-A1 | ENHANCED THIN FILM DEPOSITION | ASM INTERNATIONAL (NL) | 2019-08-29 | — | — | US | disclosed |
| US-10297444-B2 | Enhanced thin film deposition | ASM INTERNATIONAL N.V. (NL) | 2019-05-21 | — | — | US | disclosed |
| US-20180130666-A1 | ENHANCED THIN FILM DEPOSITION | ASM INTERNATIONAL (NL) | 2018-05-10 | — | — | US | disclosed |
| US-9831094-B2 | Enhanced thin film deposition | ASM INTERNATIONAL N.V. (NL) | 2017-11-28 | — | — | US | disclosed |
| US-20170154778-A1 | SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS | ASM IP HOLDING BV (NL) | 2017-06-01 | — | — | US | disclosed |
| US-9583348-B2 | Silane and borane treatments for titanium carbide films | ASM IP HOLDING B.V. (NL) | 2017-02-28 | — | — | US | disclosed |
| US-20160196977-A1 | SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS | ASM IP HOLDING BV (NL) | 2016-07-07 | — | — | US | disclosed |
| US-20160118262-A1 | ENHANCED THIN FILM DEPOSITION | ASM INTERNATIONAL (NL) | 2016-04-28 | — | — | US | disclosed |
| US-9236247-B2 | Silane and borane treatments for titanium carbide films | ASM IP HOLDING B.V. (NL) | 2016-01-12 | — | — | US | disclosed |
| US-20140295673-A1 | SILANE OR BORANE TREATMENT OF METAL THIN FILMS | ASM IP HOLDING BV (NL) | 2014-10-02 | — | — | US | disclosed |
| US-8846550-B1 | Silane or borane treatment of metal thin films | ASM IP HOLDING B.V. (NL) | 2014-09-30 | — | — | US | disclosed |
| US-8841182-B1 | Silane and borane treatments for titanium carbide films | ASM IP HOLDING B.V. (NL) | 2014-09-23 | — | — | US | disclosed |
| US-20140273428-A1 | SILANE OR BORANE TREATMENT OF METAL THIN FILMS | ASM IP HOLDING B.V. (NL) | 2014-09-18 | — | — | US | disclosed |
| US-20140273510-A1 | SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS | ASM IP HOLDING B.V. (NL) | 2014-09-18 | — | — | US | disclosed |
| US-20130183445-A1 | ENHANCED THIN FILM DEPOSITION | ASM INTERNATIONAL N.V. (NL) | 2013-07-18 | — | — | US | disclosed |
| US-7611751-B2 | Vapor deposition of metal carbide films | ASM AMERICA, INC. (US) | 2009-11-03 | — | — | US | disclosed |
| WO-2008057749-A1 | VAPOR DEPOSITION OF METAL CARBIDE FILMS | ASM AMERICA, INC. (US) | 2008-05-15 | — | — | WO | disclosed |
| US-20080102204-A1 | Vapor deposition of metal carbide films | ASM IP HOLDING B.V. (NL) | 2008-05-01 | — | — | US | disclosed |
| US-20070148350-A1 | Enhanced thin film deposition | ASM INTERNATIONAL N.V. (NL) | 2007-06-28 | — | — | US | disclosed |