SCHEMBL42933

SCHEMBL42933

CC(C)(C)CC(C)(C)c1ccccc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.60
TAAR1 Q96RJ0 1/20 0.58
CYP3A4 P08684 4/20 0.47
SMN1; SMN2 Q16637 3/20 0.47
MAPK1 P28482 1/20 0.44
ALDH1A1 P00352 4/20 0.42
HIF1A Q16665 3/20 0.42
ESR1 P03372 3/20 0.42
MEN1 O00255 2/20 0.42
APAF1 O14727 2/20 0.42
USP2 O75604 2/20 0.42
LMNA P02545 2/20 0.42
ERBB2 P04626 2/20 0.42
TP53 P04637 2/20 0.42
FYN P06241 2/20 0.42
CHRM2 P08172 2/20 0.42
CHRM4 P08173 2/20 0.42
CHRM5 P08912 2/20 0.42
ADRA2A P08913 2/20 0.42
MAPT P10636 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL25424883 0.91 SHBG (0.57) SHBGTAAR1CYP3A4SMN1; SMN2MAPK1
Phosphoric Acid SCHEMBL6372309 0.87 SHBG (0.53) SHBGTAAR1CYP3A4SMN1; SMN2ALDH1A1
Sulfurous Acid SCHEMBL28921722 0.87 SHBG (0.53) SHBGTAAR1CYP3A4SMN1; SMN2ALDH1A1
Sulfurous Acid SCHEMBL30128954 0.85 SHBG (0.47) SHBGTAAR1CYP3A4SMN1; SMN2MAPK1
Phenol SCHEMBL10999284 0.83 SHBG (0.84) SHBGTAAR1CYP3A4SMN1; SMN2ALDH1A1
SCHEMBL9577021 0.83 SHBG (0.53) SHBGTAAR1CYP3A4SMN1; SMN2ALDH1A1
SCHEMBL2270630 0.82 TAAR1 (0.56) SHBGTAAR1CYP3A4MAPK1ALDH1A1
Benzene SCHEMBL29025935 0.81 SHBG (0.91) SHBGTAAR1CYP3A4SMN1; SMN2ALDH1A1
SCHEMBL12780419 0.81 SHBG (0.52) SHBGTAAR1CYP3A4SMN1; SMN2ALDH1A1
SCHEMBL11755389 0.81 SHBG (0.52) SHBGTAAR1CYP3A4SMN1; SMN2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 243 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117964980-A Color V-shaped belt 河南耐特橡塑有限公司 2024-05-03 CN claimed
CN-117209914-A Inner pattern vulcanized rubber sleeve 河南耐特橡塑有限公司 2023-12-12 CN claimed
WO-2023033601-A1 METHOD FOR SCREENING SOLVENT FOR POLYVINYL CHLORIDE EXTRACTION, RECYCLING METHOD FOR WASTE MATERIAL, AND RECYCLED POLYVINYL CHLORIDE AND COMPOSITION 주식회사 엘지화학 2023-03-09 WO claimed
CN-105814183-B Cleaning formulation for removing residues on surfaces 富士胶片电子材料美国有限公司 2019-08-23 CN claimed
US-9659771-B2 Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning APPLIED MATERIALS, INC. (US) 2017-05-23 US claimed
EP-3105348-A1 METHODS OF NUCLEIC ACID CAPTURE Zymo Research Corporation (US) 2016-12-21 EP claimed
US-20160365248-A1 CONFORMAL STRIPPABLE CARBON FILM FOR LINE-EDGE-ROUGHNESS REDUCTION FOR ADVANCED PATTERNING APPLIED MATERIALS, INC. 2016-12-15 US claimed
WO-2015120447-A1 METHODS OF NUCLEIC ACID CAPTURE ZYMO RESEARCH CORPORATION (US) 2015-08-13 WO claimed
US-20110287633-A1 ULTRA HIGH SELECTIVITY ASHABLE HARD MASK FILM APPLIED MATERIALS, INC. (US) 2011-11-24 US claimed
CN-101407909-A Methods for high temperature deposition of an amorphous carbon layer APPLIED MATERIALS INC (US) 2009-04-15 CN claimed
US-6936551-B2 Methods and apparatus for E-beam treatment used to fabricate integrated circuit devices APPLIED MATERIALS INC. (US) 2005-08-30 US claimed
US-6914014-B2 Method for curing low dielectric constant film using direct current bias APPLIED MATERIALS, INC. (US) 2005-07-05 US claimed
US-6797643-B2 Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power APPLIED MATERIALS INC. 2004-09-28 US claimed
US-20040137758-A1 METHOD FOR CURING LOW DIELECTRIC CONSTANT FILM USING DIRECT CURRENT BIAS APPLIED MATERIALS,INC. 2004-07-15 US claimed
US-20040101632-A1 Method for curing low dielectric constant film by electron beam APPLIED MATERIALS, INC. 2004-05-27 US claimed
US-20040082193-A1 PLASMA ENHANCED CVD LOW K CARBON-DOPED SILICON OXIDE FILM DEPOSITION USING VHF-RF POWER APPLIED MATERIALS, INC 2004-04-29 US claimed
US-20030232495-A1 Methods and apparatus for E-beam treatment used to fabricate integrated circuit devices APPLIED MATERIALS, INC. 2003-12-18 US claimed
US-20030194496-A1 Methods for depositing dielectric material APPLIED MATERIALS, INC. 2003-10-16 US claimed
US-20030194495-A1 Crosslink cyclo-siloxane compound with linear bridging group to form ultra low k dielectric APPLIED MATERIALS, INC. 2003-10-16 US claimed
US-20030186000-A1 Hardness improvement of silicon carboxy films APPLIED MATERIALS, INC. 2003-10-02 US claimed